Gallium phosphide nanowires for optoelectronic devices

Author(s):  
Umesh Rizal ◽  
Bibhu P. Swain ◽  
Bhabani S. Swain
Nanoscale ◽  
2021 ◽  
Author(s):  
Alexey D. Bolshakov ◽  
Ivan I Shishkin ◽  
Andrey Machnev ◽  
Mihail Petrov ◽  
Demid Kirilenko ◽  
...  

Semiconductor nanowires provide numerous capabilities to advance development of future optoelectronic devices. Among III-V material family, gallium phosphide (GaP) is an attractive platform with low optical absorption and high nonlinear...


1983 ◽  
Vol 44 (C4) ◽  
pp. C4-233-C4-241
Author(s):  
B. Hamilton ◽  
A. R. Peaker ◽  
D. R. Wight
Keyword(s):  

1989 ◽  
Vol 50 (C8) ◽  
pp. C8-141-C8-146
Author(s):  
A. GAUSSMANN ◽  
W. DRACHSEL ◽  
J. H. BLOCK

2019 ◽  
Author(s):  
Andres Castellanos-Gomez ◽  
Patricia Gant ◽  
Riccardo Frisenda

Author(s):  
Sotirios Christodoulou ◽  
Francesco Di Stasio ◽  
Santanu Pradhan ◽  
Inigo Ramiro ◽  
Yu Bi ◽  
...  

Author(s):  
Travis Eiles ◽  
Patrick Pardy

Abstract This paper demonstrates a breakthrough method of visible laser probing (VLP), including an optimized 577 nm laser microscope, visible-sensitive detector, and an ultimate-resolution gallium phosphide-based solid immersion lens on the 10 nm node, showing a 110 nm resolution. This is 2x better than what is achieved with the standard suite of probing systems using typical infrared (IR) wavelengths today. Since VLP provides a spot diameter reduction of 0.5x over IR methods, it is reasonable, based simply on geometry, to project that VLP using the 577 nm laser will meet the industry needs for laser probing for both the 10 nm and 7 nm process nodes. Based on its high level of optimization, including high resolution and specialized solid immersion lens, it is highly likely that this VLP technology will be one of the last optically-based fault isolation methods successfully used.


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