All-Transparent Zinc Oxide-Based Phototransistor by Mist Atmospheric Pressure Chemical Vapor Deposition

Han-Yin Liu; Ruei-Chin Huang

doi:10.1109/led.2018.2889057

All-Transparent Zinc Oxide-Based Phototransistor by Mist Atmospheric Pressure Chemical Vapor Deposition

IEEE Electron Device Letters ◽

10.1109/led.2018.2889057 ◽

2019 ◽

Vol 40 (2) ◽

pp. 243-246

Author(s):

Han-Yin Liu ◽

Ruei-Chin Huang

Keyword(s):

Zinc Oxide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Pressure Chemical

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Atmospheric pressure chemical vapor deposition of transparent conducting films of fluorine doped zinc oxide and their application to amorphous silicon solar cells

Journal of Materials Science ◽

10.1007/s10853-006-1255-5 ◽

2007 ◽

Vol 42 (15) ◽

pp. 6388-6399 ◽

Cited By ~ 57

Author(s):

Haifan Liang ◽

Roy G. Gordon

Keyword(s):

Zinc Oxide ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Silicon Solar Cells ◽

Transparent Conducting Films ◽

Transparent Conducting ◽

Pressure Chemical

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Morphological, electrical and optical properties of highly oriented undoped and doped zinc oxide and cadmium oxide films grown by atmospheric-pressure chemical vapor deposition

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2013.06.015 ◽

2013 ◽

Vol 230 ◽

pp. 245-253 ◽

Cited By ~ 9

Author(s):

Tomoaki Terasako ◽

Yoshinori Ogura ◽

Ken Ohmae ◽

Shohei Fujimoto ◽

Masakazu Yagi ◽

...

Keyword(s):

Zinc Oxide ◽

Optical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Oxide Films ◽

Cadmium Oxide ◽

Chemical Vapor ◽

Electrical And Optical Properties ◽

Pressure Chemical

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Textured aluminum‐doped zinc oxide thin films from atmospheric pressure chemical‐vapor deposition

Journal of Applied Physics ◽

10.1063/1.351309 ◽

1992 ◽

Vol 71 (2) ◽

pp. 880-890 ◽

Cited By ~ 507

Author(s):

Jianhua Hu ◽

Roy G. Gordon

Keyword(s):

Thin Films ◽

Zinc Oxide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Pressure Chemical ◽

Aluminum Doped Zinc Oxide

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Electrical and optical properties of doped tin and zinc oxide thin films by atmospheric pressure chemical vapor deposition

10.1063/1.42892 ◽

1992 ◽

Cited By ~ 1

Author(s):

Jianhua Hu ◽

Roy G. Gordon

Keyword(s):

Thin Films ◽

Zinc Oxide ◽

Optical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Electrical And Optical Properties ◽

Pressure Chemical

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Atmospheric pressure chemical vapor deposition of gallium doped zinc oxide thin films from diethyl zinc, water, and triethyl gallium

Journal of Applied Physics ◽

10.1063/1.351977 ◽

1992 ◽

Vol 72 (11) ◽

pp. 5381-5392 ◽

Cited By ~ 216

Author(s):

Jianhua Hu ◽

Roy G. Gordon

Keyword(s):

Thin Films ◽

Zinc Oxide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Diethyl Zinc ◽

Pressure Chemical

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Growth of zinc oxide films and nanowires by atmospheric-pressure chemical vapor deposition using zinc powder and water as source materials

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2007.04.017 ◽

2007 ◽

Vol 201 (22-23) ◽

pp. 8924-8930 ◽

Cited By ~ 35

Author(s):

T. Terasako ◽

M. Yagi ◽

M. Ishizaki ◽

Y. Senda ◽

H. Matsuura ◽

...

Keyword(s):

Zinc Oxide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Oxide Films ◽

Chemical Vapor ◽

Zinc Powder ◽

Zinc Oxide Films ◽

Pressure Chemical ◽

Source Materials

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Investigation of Bandgap Engineering of Gallium Zinc Oxide-Based Ultraviolet Photodetector by Mist Atmospheric Pressure Chemical Vapor Deposition

IEEE Transactions on Electron Devices ◽

10.1109/ted.2019.2904986 ◽

2019 ◽

Vol 66 (5) ◽

pp. 2256-2262 ◽

Cited By ~ 2

Author(s):

Han-Yin Liu ◽

Guan-Jyun Liu

Keyword(s):

Zinc Oxide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Ultraviolet Photodetector ◽

Bandgap Engineering ◽

Pressure Chemical

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Rapid Formation of Zinc Oxide Films by an Atmospheric-Pressure Chemical Vapor Deposition Method

Journal of the American Ceramic Society ◽

10.1111/j.1151-2916.1994.tb07021.x ◽

1994 ◽

Vol 77 (2) ◽

pp. 505-508 ◽

Cited By ~ 14

Author(s):

Kiichiro Kamata ◽

Junichi Nishino ◽

Shigeo Ohshio ◽

Kazunori Maruyama ◽

Motohiko Ohtuki

Keyword(s):

Zinc Oxide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Zinc Oxide Films ◽

Rapid Formation ◽

Pressure Chemical

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ChemInform Abstract: Rapid Formation of Zinc Oxide Films by an Atmospheric-Pressure Chemical Vapor Deposition Method.

ChemInform ◽

10.1002/chin.199427017 ◽

2010 ◽

Vol 25 (27) ◽

pp. no-no

Author(s):

K. KAMATA ◽

J. NISHINO ◽

S. OHSHIO ◽

K. MARUYAMA ◽

M. OHTUKI

Keyword(s):

Zinc Oxide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Zinc Oxide Films ◽

Rapid Formation ◽

Pressure Chemical

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Atmospheric pressure chemical vapor deposition of blanket tungsten films on silicon substrates for integrated circuit applications

Journal of Electronic Materials ◽

10.1007/bf02659737 ◽

1995 ◽

Vol 24 (6) ◽

pp. 761-766 ◽

Cited By ~ 4

Author(s):

M. S. Haque ◽

U. V. Patel ◽

H. A. Naseem ◽

W. D. Brown

Keyword(s):

Chemical Vapor Deposition ◽

Integrated Circuit ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Silicon Substrates ◽

Pressure Chemical

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