Electrical and optical properties of doped tin and zinc oxide thin films by atmospheric pressure chemical vapor deposition

Mapping Intimacies ◽

10.1063/1.42892 ◽

1992 ◽

Cited By ~ 1

Author(s):

Jianhua Hu ◽

Roy G. Gordon

Keyword(s):

Thin Films ◽

Zinc Oxide ◽

Optical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Electrical And Optical Properties ◽

Pressure Chemical

Download Full-text

Morphological, electrical and optical properties of highly oriented undoped and doped zinc oxide and cadmium oxide films grown by atmospheric-pressure chemical vapor deposition

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2013.06.015 ◽

2013 ◽

Vol 230 ◽

pp. 245-253 ◽

Cited By ~ 9

Author(s):

Tomoaki Terasako ◽

Yoshinori Ogura ◽

Ken Ohmae ◽

Shohei Fujimoto ◽

Masakazu Yagi ◽

...

Keyword(s):

Zinc Oxide ◽

Optical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Oxide Films ◽

Cadmium Oxide ◽

Chemical Vapor ◽

Electrical And Optical Properties ◽

Pressure Chemical

Download Full-text

Textured aluminum‐doped zinc oxide thin films from atmospheric pressure chemical‐vapor deposition

Journal of Applied Physics ◽

10.1063/1.351309 ◽

1992 ◽

Vol 71 (2) ◽

pp. 880-890 ◽

Cited By ~ 507

Author(s):

Jianhua Hu ◽

Roy G. Gordon

Keyword(s):

Thin Films ◽

Zinc Oxide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Pressure Chemical ◽

Aluminum Doped Zinc Oxide

Download Full-text

Atmospheric pressure chemical vapor deposition of gallium doped zinc oxide thin films from diethyl zinc, water, and triethyl gallium

Journal of Applied Physics ◽

10.1063/1.351977 ◽

1992 ◽

Vol 72 (11) ◽

pp. 5381-5392 ◽

Cited By ~ 216

Author(s):

Jianhua Hu ◽

Roy G. Gordon

Keyword(s):

Thin Films ◽

Zinc Oxide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Diethyl Zinc ◽

Pressure Chemical

Download Full-text

A study of aluminum oxide thin films prepared by atmospheric-pressure chemical vapor deposition from trimethylaluminum + oxygen and/or nitrous oxide

Journal of Electronic Materials ◽

10.1007/bf02652101 ◽

1988 ◽

Vol 17 (6) ◽

pp. 509-517 ◽

Cited By ~ 17

Author(s):

Kenneth Michael Gustin ◽

Roy Gerald Gordon

Keyword(s):

Thin Films ◽

Nitrous Oxide ◽

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Pressure Chemical

Download Full-text

Low-temperature atmospheric-pressure chemical vapor deposition of tungsten oxide thin films

Thin Solid Films ◽

10.1016/0040-6090(93)90233-f ◽

1993 ◽

Vol 235 (1-2) ◽

pp. 15-16 ◽

Cited By ~ 20

Author(s):

Umar Riaz

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Tungsten Oxide ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Pressure Chemical ◽

Tungsten Oxide Thin Films

Download Full-text

Electrical and optical properties of titanium nitride coatings prepared by atmospheric pressure chemical vapor deposition

Journal of Non-Crystalline Solids ◽

10.1016/j.jnoncrysol.2006.11.036 ◽

2008 ◽

Vol 354 (12-13) ◽

pp. 1272-1275 ◽

Cited By ~ 33

Author(s):

Gaoling Zhao ◽

Tianbo Zhang ◽

Tao Zhang ◽

Jianxun Wang ◽

Gaorong Han

Keyword(s):

Optical Properties ◽

Chemical Vapor Deposition ◽

Titanium Nitride ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Electrical And Optical Properties ◽

Nitride Coatings ◽

Pressure Chemical

Download Full-text

Morphology and optical properties of zinc oxide thin films grown on Si (100) by metal-organic chemical vapor deposition

Journal of Materials Science Materials in Electronics ◽

10.1007/s10854-008-9664-7 ◽

2008 ◽

Vol 20 (S1) ◽

pp. 441-445 ◽

Cited By ~ 6

Author(s):

S. M. Lan ◽

W. Y. Uen ◽

C. E. Chan ◽

K. J. Chang ◽

S. C. Hung ◽

...

Keyword(s):

Thin Films ◽

Zinc Oxide ◽

Optical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Oxide Thin Films ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

Download Full-text

Dependence of O2, N2 flow rate and deposition time on the structural, electrical and optical properties of SnO2 thin films deposited by atmospheric pressure chemical vapor deposition (APCVD)

Journal of Materials Science Materials in Electronics ◽

10.1007/s10854-015-3835-0 ◽

2015 ◽

Vol 27 (1) ◽

pp. 921-930 ◽

Cited By ~ 4

Author(s):

M. R. Fadavieslam ◽

H. Azimi-Juybari ◽

M. Marashi

Keyword(s):

Thin Films ◽

Optical Properties ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Deposition Time ◽

Chemical Vapor ◽

Electrical And Optical Properties ◽

Pressure Chemical ◽

Sno2 Thin Films ◽

N2 Flow Rate

Download Full-text

Atmospheric-pressure chemical vapor deposition of fluorine-doped tin oxide thin films

Thin Solid Films ◽

10.1016/s0040-6090(98)01421-7 ◽

1999 ◽

Vol 345 (2) ◽

pp. 240-243 ◽

Cited By ~ 32

Author(s):

Seigi Suh ◽

Zuhua Zhang ◽

Wei-Kan Chu ◽

David M. Hoffman

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Tin Oxide ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Pressure Chemical

Download Full-text

Structure, electrical and optical properties of TiNx films by atmospheric pressure chemical vapor deposition

Applied Surface Science ◽

10.1016/j.apsusc.2010.11.180 ◽

2011 ◽

Vol 257 (7) ◽

pp. 2428-2431 ◽

Cited By ~ 17

Author(s):

Gangfeng Duan ◽

Gaoling Zhao ◽

Ling Wu ◽

Xiaoxuan Lin ◽

Gaorong Han

Keyword(s):

Optical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Electrical And Optical Properties ◽

Pressure Chemical

Download Full-text