A high-performance multichannel dual-gate poly-Si TFT fabricated by excimer laser irradiation on a floating a-Si thin film

2003 ◽  
Vol 24 (9) ◽  
pp. 580-582 ◽  
Author(s):  
In-Hyuk Song ◽  
Su-Hyuk Kang ◽  
Woo-Jin Nam ◽  
Min-Koo Han
Keyword(s):  
Thin Film ◽  
Laser Irradiation ◽  
Excimer Laser ◽  
High Performance ◽  
Dual Gate ◽  
Excimer Laser Irradiation ◽  
Si Thin Film

High-Performance Poly-Si Thin Film Transistors Crystallized by Excimer Laser Irradiation with A-Si Spacer Structure

2005 ◽  
Vol 8 (1) ◽  
pp. G14 ◽  
Author(s):  
Ting-Kuo Chang ◽  
Ching-Wei Lin ◽  
Chun-Chien Tsai ◽  
Jian-Hao Lu ◽  
Bo-Ting Chen ◽  
...  
Keyword(s):  
Thin Film ◽  
Laser Irradiation ◽  
Excimer Laser ◽  
Thin Film Transistors ◽  
High Performance ◽  
Excimer Laser Irradiation ◽  
Si Thin Film

Flat Panel Imagers Based on Excimer Laser Annealed, poly-Si Thin Film Transistor Technology

2001 ◽  
Vol 685 ◽  
Author(s):  
J.P. Lu ◽  
K. Van Schuylenbergh ◽  
R. T. Fulks ◽  
J. Ho ◽  
Y. Wang ◽  
...  
Keyword(s):  
Thin Film ◽  
Excimer Laser ◽  
High Performance ◽  
Laser Annealing ◽  
Noise Performance ◽  
Large Area ◽  
Flat Panel ◽  
Excimer Laser Annealing ◽  
Flat Panel Imagers ◽  
Si Thin Film

AbstractPulsed Excimer-Laser Annealing (ELA) has become an important technology to produce high performance, poly-Si Thin Film Transistors (TFTs) for large area electronics. The much-improved performance of these poly-Si TFTs over the conventional hydrogenated amorphous Si TFTs enables the possibility of building next generation flat panel imagers with higher-level integration and better noise performance. Both the on-glass integration of peripheral driver electronics to reduce the cost of interconnection and the integration of a pixel level amplifier to improve the noise performance of large area imagers have been demonstrated and are discussed in this paper.

Enlargement of Poly-Si Film Grain Size by Excimer Laser Annealing and Its Application to High-Performance Poly-Si Thin Film Transistor

1991 ◽  
Vol 30 (Part 1, No. 12B) ◽  
pp. 3700-3703 ◽  
Author(s):  
Hiroyuki Kuriyama ◽  
Seiichi Kiyama ◽  
Shigeru Noguchi ◽  
Takashi Kuwahara ◽  
Satoshi Ishida ◽  
...  
Keyword(s):  
Thin Film ◽  
Grain Size ◽  
Excimer Laser ◽  
High Performance ◽  
Laser Annealing ◽  
Thin Film Transistor ◽  
Excimer Laser Annealing ◽  
Si Thin Film

scholarly journals Fabrication of Thin-Film YBCO Josephson Junctions by Excimer Laser Irradiation.

1991 ◽  
Vol 19 (7) ◽  
pp. 627-633 ◽  
Author(s):  
Jian CHEN ◽  
Takashi NOZUE ◽  
Yoshiyuki KIYOSAWA ◽  
Hajime SUZUKI ◽  
Tsutomu YAMASHITA ◽  
...  
Keyword(s):  
Thin Film ◽  
Laser Irradiation ◽  
Excimer Laser ◽  
Josephson Junctions ◽  
Excimer Laser Irradiation

High Performance Dual Gate Blue Laser Annealed Poly-Si Thin-Film Transistor for High-Resolution Displays

2021 ◽  
pp. 1-7
Author(s):  
Duk Young Jeong ◽  
Mohammad Masum Billah ◽  
Abu Bakar Siddik ◽  
Byungju Han ◽  
Yeoungjin Chang ◽  
...  
Keyword(s):  
Thin Film ◽  
High Resolution ◽  
High Performance ◽  
Thin Film Transistor ◽  
Blue Laser ◽  
Dual Gate ◽  
Si Thin Film
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