Design of Chirped Gratings using Interferometric Lithography

2018 ◽  
Author(s):  
Steve Benoit ◽  
S. R. J. Brueck
Keyword(s):  
Interferometric Lithography ◽  
Chirped Gratings

scholarly journals Design of Chirped Gratings Using Interferometric Lithography

2018 ◽  
Vol 10 (2) ◽  
pp. 1-13 ◽  
Author(s):  
Steve Benoit ◽  
S. R. J. Brueck
Keyword(s):  
Interferometric Lithography ◽  
Chirped Gratings

scholarly journals Nanopatterning in a compact setup using table top extreme ultraviolet lasers

2008 ◽  
Vol 16 (4) ◽  
Author(s):  
P. Wachulak ◽  
M. Capeluto ◽  
C. Menoni ◽  
J. Rocca ◽  
M. Marconi
Keyword(s):  
Extreme Ultraviolet ◽  
Laser Pulses ◽  
Hydrogen Silsesquioxane ◽  
Time Duration ◽  
Interferometric Lithography ◽  
Euv Lasers ◽  
Extreme Ultraviolet Lasers ◽  
New Applications ◽  
Compact Sources ◽  
Discharge Laser

AbstractThe recent development of table top extreme ultraviolet (EUV) lasers have enabled new applications that so far were restricted to the use of large facilities. These compact sources bring now to the laboratory environment the capabilities that will allow a broader application of techniques related to nanotechnology and nanofabrication. In this paper we review the advances in the utilization of EUV lasers in nanopatterning. In particular we show results of the nanopatterning using a table-top capillary discharge laser producing 0.12-mJ laser pulses with 1.2-ns time duration at a wavelength λ = 46.9 nm. The nanopatterning was realized by interferometric lithography using a Lloyd’s mirror interferometer. Two standard photoresists were used in this work, polymethyl methacrylate (PMMA) and hydrogen silsesquioxane (HSQ). Pillars with a full width half maximum (FWHM) diameter of 60 nm and holes with FWHM diameter of 130 nm were obtained over areas in excess of 500×500 μm2.

Fabrication of metallic micropatterns using table top extreme ultraviolet laser interferometric lithography

2008 ◽  
Vol 17 (2) ◽  
pp. 024019 ◽  
Author(s):  
L Ottaviano ◽  
F Bussolotti ◽  
S Piperno ◽  
M Rinaldi ◽  
S Santucci ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Ultraviolet Laser ◽  
Interferometric Lithography ◽  
Laser Interferometric

Deep UV immersion interferometric lithography

2003 ◽  
Author(s):  
Alex K. Raub ◽  
Steven R. J. Brueck
Keyword(s):  
Interferometric Lithography ◽  
Deep Uv

scholarly journals Design and Fabrication of Moth-Eye Subwavelength Structure with a Waist on Silicon for Broadband and Wide-Angle Anti-Reflection Property

Coatings ◽  
2018 ◽  
Vol 8 (10) ◽  
pp. 360 ◽  
Author(s):  
He Lin ◽  
Mingzhao Ouyang ◽  
Bingxu Chen ◽  
Qifan Zhu ◽  
Jinshuang Wu ◽  
...  
Keyword(s):  
Inductively Coupled Plasma ◽  
Incidence Angle ◽  
Structural Parameters ◽  
Diffraction Order ◽  
Wide Angle ◽  
Subwavelength Structure ◽  
Inductively Coupled ◽  
Beam Laser ◽  
Interferometric Lithography ◽  
Rigorous Coupled Wave

Reflection loss on the optical component surface is detrimental to performance. Several researchers have discovered that the eyes of moths are covered with micro- and nanostructured films that reduce broadband and wide-angle light reflection. This research proposes a new type of moth-eye subwavelength structure with a waist, which is equivalent to a gradient refractive index film layer with high–low–high hyperbolic-type fill factor distribution. The diffraction order characteristics of a moth-eye subwavelength structure are first analyzed using a rigorous coupled wave analysis. The moth-eye structural parameters are optimized within the spectral range of 2–5 μm using the finite-difference time-domain method. The experimental fabrication of the moth-eye structure with a waist array upon a silicon substrate is demonstrated by using three-beam laser interferometric lithography and an inductively coupled plasma process. The experimental and simulation results show good agreement. The experimental results show that the reflectivity of the moth-eye structure with a waist is less than 1.3% when the incidence angle is less than 30°, and less than 4% when the incidence angle is less than 60°. This research can guide the development of AR broadband optical components and wide-angle applications.

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