Multiple-exposure interferometric lithography

1993 ◽  
Vol 11 (3) ◽  
pp. 658 ◽  
Author(s):  
Saleem H. Zaidi
Keyword(s):  
Multiple Exposure ◽  
Interferometric Lithography

scholarly journals Nanopatterning in a compact setup using table top extreme ultraviolet lasers

2008 ◽  
Vol 16 (4) ◽  
Author(s):  
P. Wachulak ◽  
M. Capeluto ◽  
C. Menoni ◽  
J. Rocca ◽  
M. Marconi
Keyword(s):  
Extreme Ultraviolet ◽  
Laser Pulses ◽  
Hydrogen Silsesquioxane ◽  
Time Duration ◽  
Interferometric Lithography ◽  
Euv Lasers ◽  
Extreme Ultraviolet Lasers ◽  
New Applications ◽  
Compact Sources ◽  
Discharge Laser

AbstractThe recent development of table top extreme ultraviolet (EUV) lasers have enabled new applications that so far were restricted to the use of large facilities. These compact sources bring now to the laboratory environment the capabilities that will allow a broader application of techniques related to nanotechnology and nanofabrication. In this paper we review the advances in the utilization of EUV lasers in nanopatterning. In particular we show results of the nanopatterning using a table-top capillary discharge laser producing 0.12-mJ laser pulses with 1.2-ns time duration at a wavelength λ = 46.9 nm. The nanopatterning was realized by interferometric lithography using a Lloyd’s mirror interferometer. Two standard photoresists were used in this work, polymethyl methacrylate (PMMA) and hydrogen silsesquioxane (HSQ). Pillars with a full width half maximum (FWHM) diameter of 60 nm and holes with FWHM diameter of 130 nm were obtained over areas in excess of 500×500 μm2.

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