A novel approach to chemically amplified resist materials for next generation of lithography

2003 ◽  
Author(s):  
Kyoung-sun Park ◽  
Dae-yong Kim ◽  
Sang-kuk Choi ◽  
Dong Hack Suh
Keyword(s):  
Next Generation ◽  
Chemically Amplified ◽  
Novel Approach ◽  
Chemically Amplified Resist

Novel Approach to Chemically Amplified Resist Materials for Next Generation of Lithography

2003 ◽  
Vol 42 (Part 1, No. 6B) ◽  
pp. 3877-3880 ◽  
Author(s):  
Kyoung-sun Park ◽  
Dae-yong Kim ◽  
Sang-kuk Choi ◽  
Dong Hack Suh
Keyword(s):  
Next Generation ◽  
Chemically Amplified ◽  
Novel Approach ◽  
Chemically Amplified Resist

Evaluation of an advanced chemically amplified resist for next-generation lithography mask fabrication

2001 ◽  
Author(s):  
Christopher Magg ◽  
Michael J. Lercel ◽  
Mark Lawliss ◽  
Ranee W. Kwong ◽  
Wu-Song Huang ◽  
...  
Keyword(s):  
Next Generation ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Next Generation Lithography ◽  
Mask Fabrication

Chemically amplified resist technology for i-line applications

1998 ◽  
Author(s):  
Medhat A. Toukhy ◽  
Sanjay Malik ◽  
Andrew J. Blakeney ◽  
Karin R. Schlicht
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resist

Sub-150-nm electron-beam lithography using AZPN114 chemically amplified resist

1997 ◽  
Author(s):  
Zheng Cui ◽  
R. A. Moody ◽  
Ian M. Loader ◽  
John G. Watson ◽  
Philip D. Prewett
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

Postexposure Delay Effect on Linewidth Variation in Base Added Chemically Amplified Resist

2000 ◽  
Vol 147 (10) ◽  
pp. 3833 ◽  
Author(s):  
Chin-Yu Ku ◽  
Jia-Min Shieh ◽  
Tsann-Bim Chiou ◽  
Hwang-Kuen Lin ◽  
Tan Fu Lei
Keyword(s):  
Delay Effect ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

Airborne Contamination of a Chemically Amplified Resist. 2. Effect of Polymer Film Properties on Contamination Rate

1994 ◽  
Vol 6 (4) ◽  
pp. 481-488 ◽  
Author(s):  
William D. Hinsberg ◽  
Scott A. MacDonald ◽  
Nicholas J. Clecak ◽  
Clinton D. Snyder
Keyword(s):  
Polymer Film ◽  
Contamination Rate ◽  
Film Properties ◽  
Chemically Amplified ◽  
Airborne Contamination ◽  
Chemically Amplified Resist

Track oriented chemically-amplified resist processes for quarter-micron lithography

1993 ◽  
Author(s):  
Michael T. Reilly ◽  
Azalia A. Krasnoperova ◽  
Quinn J. Leonard ◽  
James W. Taylor ◽  
Shaowie Pan
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resist
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