Chromium Nitride Coating by Inductively Coupled Plasma-assisted RF Magnetron Sputtering

2006 ◽  
Author(s):  
Ho-sung Jang ◽  
Yu-sung Kim ◽  
Dae-han Choi ◽  
Jae-young Lee ◽  
Ji-hye Park ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Inductively Coupled Plasma ◽  
Rf Magnetron Sputtering ◽  
Chromium Nitride ◽  
Nitride Coating ◽  
Inductively Coupled

Comparison of chromium nitride coatings deposited by DC and RF magnetron sputtering

2011 ◽  
Vol 519 (7) ◽  
pp. 2116-2120 ◽  
Author(s):  
Shuyong Tan ◽  
Xuhai Zhang ◽  
Xiangjun Wu ◽  
Feng Fang ◽  
Jianqing Jiang
Keyword(s):  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Chromium Nitride ◽  
Nitride Coatings

HIGH-QUALITY INTRINSIC ZnO FILM FOR THE APPLICATION OF SOLAR CELL GROWN BY ICP-ASSISTED REACTIVE DC MAGNETRON SPUTTERING AT LOW TEMPERATURE

2007 ◽  
Vol 14 (06) ◽  
pp. 1083-1087
Author(s):  
X. B. XU ◽  
S. M. HUANG ◽  
Y. W. CHEN ◽  
Z. SUN ◽  
S. Y. HUANG
Keyword(s):  
Solar Cell ◽  
Low Temperature ◽  
Magnetron Sputtering ◽  
Inductively Coupled Plasma ◽  
Visible Range ◽  
Zno Film ◽  
Dc Magnetron Sputtering ◽  
Working Pressure ◽  
Solar Cell Application ◽  
Inductively Coupled

Intrinsic zinc oxide (i- ZnO ) film was prepared for CuInSe 2 (CIS) solar cell application [L. Stolt and J. Hedstrom, Appl. Phys. Lett.62 (1993) 8; D. Rudmann, Ph.D. Thesis, University of Basel, Basel, (2004)] on glass substrate by inductively coupled plasma (ICP)-assisted DC magnetron sputtering and under a quite low temperature of 50°C. The sputtering was done in an Ar and O 2 gas mixture and a ceramic ZnO target was used. The microstructures of the film were investigated by X-ray diffractometer and scanning electron microscope. It was shown that all of the films had a c-axis preferred orientation perpendicular to the substrate. In our work, film with resistivity of 7 × 108Ω· cm and transmittance of about 80% in the visible range was prepared under the conditions of 4 mTorr working pressure and 50°C temperature.

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