Growth and characterization of Si-based light-emitting diode with β-FeSi/sub 2/ active region by molecular beam epitaxy

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M. Takauji ◽  
T. Sunohara ◽  
C. Li ◽  
F. Hasegawa
2005 ◽  
Vol 44 (6A) ◽  
pp. 3951-3953 ◽  
Author(s):  
Tsuyoshi Sunohara ◽  
Cheng Li ◽  
Yoshinori Ozawa ◽  
Takashi Suemasu ◽  
Fumio Hasegawa

2010 ◽  
Vol 3 (3) ◽  
pp. 032101 ◽  
Author(s):  
Zheng Yang ◽  
Sheng Chu ◽  
Winnie V. Chen ◽  
Lin Li ◽  
Jieying Kong ◽  
...  

2008 ◽  
Vol 5 (9) ◽  
pp. 3069-3072 ◽  
Author(s):  
Hiroto Sekiguchi ◽  
Kei Kato ◽  
Akihiko Kikuchi ◽  
Katsumi Kishino

1998 ◽  
Vol 34 (15) ◽  
pp. 1519 ◽  
Author(s):  
M. Jalonen ◽  
J. Köngäs ◽  
M. Toivonen ◽  
P. Savolainen ◽  
S. Orsila ◽  
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2007 ◽  
Vol 19 (2) ◽  
pp. 109-111 ◽  
Author(s):  
S. K. Ray ◽  
T. L. Choi ◽  
K. M. Groom ◽  
H. Y. Liu ◽  
M. Hopkinson ◽  
...  

2014 ◽  
Vol 2 (21) ◽  
pp. 4112-4116 ◽  
Author(s):  
Wenliang Wang ◽  
Yunhao Lin ◽  
Weijia Yang ◽  
Zuolian Liu ◽  
Shizhong Zhiou ◽  
...  

High-quality nonpolar m-plane GaN-based light-emitting diode (LED) wafers have been deposited on LiGaO2(100) substrates by a combination of pulsed laser deposition and molecular beam epitaxy technologies.


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