A novel technique for increasing charge injection capacity of neural electrodes for efficacious and safe neural stimulation

Author(s):  
S. Negi ◽  
R. Bhandari ◽  
F. Solzbacher
Proceedings ◽  
2017 ◽  
Vol 1 (4) ◽  
pp. 492 ◽  
Author(s):  
Anmona S. Pranti ◽  
Andreas Schander ◽  
André Bödecker ◽  
Walter Lang

2018 ◽  
Author(s):  
Ian Williams

Biphasic charge balanced waveforms do not minimise faradaic processes at the electrode-electrolyte boundary and do not leave electrodes neutral with respect to the tissue. Superior waveforms for electrode health (and consequently tissue safety) exist and may also offer better performance in terms of power consumption and stimulation effectiveness within charge injection limits. This paper aims to provide intuitive insight into the limitations of biphasic waveforms and presents a simple method for assessing how well other waveforms will perform, as well as methods for designing waveforms to theoretically give zero residual voltage and zero net faradaic charge transfer.


2006 ◽  
Vol 53 (2) ◽  
pp. 327-332 ◽  
Author(s):  
S.F. Cogan ◽  
P.R. Troyk ◽  
J. Ehrlich ◽  
T.D. Plante ◽  
D.E. Detlefsen

2010 ◽  
Vol 57 (9) ◽  
pp. 2313-2321 ◽  
Author(s):  
Stuart F Cogan ◽  
Julia Ehrlich ◽  
Timothy D Plante ◽  
Marcus D Gingerich ◽  
Douglas B Shire

1987 ◽  
Vol 110 ◽  
Author(s):  
Ellen M. Kelliher ◽  
Timothy L. Rose

AbstractThe charge injection limits of a variety of thin film redox materials considered for use as neural stimulation electrodes were evaluated under standardized conditions. Materials tested included the oxides of Ni, Ir, Rh, Ru, and Mn as well as conductive polypyrrole films. Electrodes with geometric areas of, ∼10–4 cm2were tested in bicarbonate buffered saline of pH 7.3. An electrochemically “safe” potential window was determined for each material by cyclic voltammetry. Charge injection capabilities within that window are evaluated with constant current 0.2 msec pulses. Pulse modes include anodic first and cathodic first biphasic pulses and monophasic cathodal pulses applied to electrodes held at an anodic bias. Pulsing from the anodic bias increased the charge limits for all the materials, but the most dramatic improvement was for Rh oxide. The highest charge injection values were obtained with oxides of iridium and rhodium and were of comparable value for the anodic bias mode of pulsing. Where the effect of film thickness was examined, the charge injection limit leveled off at 2–4 mC/cm2geometric as the film thickness increased.


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