Development of reactive ion etching process for deep etching of silicon for micro-mixer device fabrication

Author(s):  
Saakshi Dhanekar ◽  
Ruchi Tiwari ◽  
Bhagaban Behera ◽  
Sudhir Chandra ◽  
R. Balasubramaniam
2006 ◽  
Vol 16 (12) ◽  
pp. 2570-2575 ◽  
Author(s):  
Yiyong Tan ◽  
Rongchun Zhou ◽  
Haixia Zhang ◽  
Guizhang Lu ◽  
Zhihong Li

2014 ◽  
Vol 22 (5) ◽  
pp. 5986 ◽  
Author(s):  
Mateusz Śmietana ◽  
Marcin Koba ◽  
Predrag Mikulic ◽  
Wojtek J. Bock

1996 ◽  
Vol 5 (6-8) ◽  
pp. 840-844 ◽  
Author(s):  
C. Vivensang ◽  
L. Ferlazzo-Manin ◽  
M.F. Ravet ◽  
G. Turban ◽  
F. Rousseaux ◽  
...  

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