Statistical methods for measurement reduction in semiconductor manufacturing

2002 ◽  
Author(s):  
R. Babikian ◽  
C. Engelhard
Keyword(s):  
Statistical Methods ◽  
Semiconductor Manufacturing ◽  
Measurement Reduction

Statistics and parallaxes

1978 ◽  
Vol 48 ◽  
pp. 7-29
Author(s):  
T. E. Lutz
Keyword(s):  
Experimental Design ◽  
Statistical Methods ◽  
Review Paper ◽  
Systematic Errors ◽  
Past Experience ◽  
Random Errors ◽  
Trigonometric Parallaxes ◽  
Systematic And Random Errors

This review paper deals with the use of statistical methods to evaluate systematic and random errors associated with trigonometric parallaxes. First, systematic errors which arise when using trigonometric parallaxes to calibrate luminosity systems are discussed. Next, determination of the external errors of parallax measurement are reviewed. Observatory corrections are discussed. Schilt’s point, that as the causes of these systematic differences between observatories are not known the computed corrections can not be applied appropriately, is emphasized. However, modern parallax work is sufficiently accurate that it is necessary to determine observatory corrections if full use is to be made of the potential precision of the data. To this end, it is suggested that a prior experimental design is required. Past experience has shown that accidental overlap of observing programs will not suffice to determine observatory corrections which are meaningful.

Review of Statistical Methods for Rates and Proportions.

1973 ◽  
Vol 18 (11) ◽  
pp. 562-562
Author(s):  
B. J. WINER
Keyword(s):  
Statistical Methods

Review of Statistical Methods in Education and Psychology.

1996 ◽  
Vol 41 (12) ◽  
pp. 1224-1224
Author(s):  
Terri Gullickson
Keyword(s):  
Statistical Methods

Review of Statistical methods in education and psychology.

1979 ◽  
Vol 24 (6) ◽  
pp. 536-536
Author(s):  
JOHN W. COTTON
Keyword(s):  
Statistical Methods
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