Control methods for the chemical-mechanical polishing process in shallow trench isolation

Author(s):  
Y. Wu ◽  
J. Gilhooly ◽  
B. Philips
1998 ◽  
Vol 37 (Part 1, No. 11) ◽  
pp. 5849-5853 ◽  
Author(s):  
Heungsoo Park ◽  
Kwang-Bok Kim ◽  
Chang-Ki Hong ◽  
U-In Chung ◽  
Moon-Yong Lee

2001 ◽  
Vol 671 ◽  
Author(s):  
Hyungjun Kim ◽  
Panki Kwon ◽  
Sukjae Lee ◽  
Hyung-Hwan Kim ◽  
Sang-Ick Lee ◽  
...  

ABSTRACTA pattern specific corrosion of aluminum wires was found during aluminum chemical mechanical polishing process. This paper presents and discusses the particular pattern dependency of the corrosion behavior and effective control methods in order to reduce the corrosion. An aluminum single damascene structure on silicon dioxide thin film was prepared and the effects of process variables and pattern configuration on corrosion behavior were extensively explored. The corrosion behavior was quantitatively analyzed using sheet resistance of corroded line. It was demonstrated that corrosion of aluminum wire was associated with cleaning media and pattern configuration. The area ratio between sub-micron size line and pads was the most important factors to determine the corrosion behavior. A post cleaning chemical including corrosion inhibitor couldn't prevent the corrosion perfectly. It was found that sacrificial dummy lines could reduce the aluminum corrosion, which suggests that the aluminum corrosion could be controlled by the structural consideration in aluminum damascene.


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