Structuring of silicon surface after vacuum-plasma treatment through discontinuous carbon film

2016 ◽  
Author(s):  
D. V. Nefedov ◽  
V. Ya. Shanygin ◽  
S. Yu. Suzdaltsev ◽  
R. K. Yafarov
Keyword(s):  
Plasma Treatment ◽  
Silicon Surface ◽  
Carbon Film ◽  
Vacuum Plasma

Effect of preliminary vacuum plasma treatment on coating adhesion

2016 ◽  
Author(s):  
Vladimir A. Slabodchikov ◽  
Dmitry P. Borisov ◽  
Vladimir M. Kuznetsov
Keyword(s):  
Plasma Treatment ◽  
Coating Adhesion ◽  
Vacuum Plasma

The Effects of Chemical Vapor Cleaning Chemistries on Silicon Surfaces

1993 ◽  
Vol 318 ◽  
Author(s):  
S.E. Beck ◽  
A.G. Gilicinski ◽  
B.S. Felker ◽  
J.G. Langan ◽  
D.A. Bohling ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Plasma Treatment ◽  
Silicon Surface ◽  
Chemical Vapor ◽  
Silicon Surfaces ◽  
Nitride Film ◽  
Silicon Nitride Film ◽  
Thin Silicon

ABSTRACTThis study explores the effects of two chemical vapor cleaning chemistries on silicon surfaces. The silicon surfaces are not significantly roughened by exposure to either process. Trace amounts of fluorine are found on the surfaces exposed to 1,1,1,5,5,5-hexafluoro-2,4-pentanedione (HFAC). A thin silicon nitride film forms on the silicon surface as a result of exposure to the HMDS process and is attributed to the H2/N2 plasma treatment used in the first step of the process.

Improvement of crystalline silicon surface passivation by hydrogen plasma treatment

2004 ◽  
Vol 84 (9) ◽  
pp. 1474-1476 ◽  
Author(s):  
I. Martı́n ◽  
M. Vetter ◽  
A. Orpella ◽  
C. Voz ◽  
J. Puigdollers ◽  
...  
Keyword(s):  
Plasma Treatment ◽  
Silicon Surface ◽  
Surface Passivation ◽  
Crystalline Silicon ◽  
Hydrogen Plasma ◽  
Silicon Surface Passivation

Increased Hydrophilicity of Silicon Surface through Plasma Treatment with Hydrogen Peroxide Gas

2021 ◽  
Vol MA2021-01 (31) ◽  
pp. 1028-1028
Author(s):  
Jeff Spiegelman ◽  
Daniel Alvarez ◽  
Chris Ramos ◽  
Keisuke Andachi ◽  
Gaku Tsuchibuchi ◽  
...  
Keyword(s):  
Hydrogen Peroxide ◽  
Plasma Treatment ◽  
Silicon Surface

DONOR GENERATION IN PLASMA TREATED SILICON

1989 ◽  
Vol 03 (06) ◽  
pp. 485-488
Author(s):  
O.E. KUSMARTSEVA ◽  
F.D. SENCHUKOV
Keyword(s):  
Surface Layer ◽  
Plasma Treatment ◽  
Silicon Surface ◽  
Discharge Plasma ◽  
Gas Discharge ◽  
Donor Center ◽  
Treatment Regimes ◽  
Donor Behavior ◽  
Conduction Type ◽  
Gas Discharge Plasma

An inversion of the conduction type of the p-silicon surface layer by gas discharge plasma treatment was observed. It was found that this conduction inversion was conditioned by donor center formation. Donor behavior are discussed. Some plasma treatment regimes to induce the donor centers in silicon are reported.

scholarly journals Plasma Treated Active Carbon for Capacitive Deionization of Saline Water

2017 ◽  
Vol 2017 ◽  
pp. 1-8 ◽  
Author(s):  
Aiping Zeng ◽  
Maheshwar Shrestha ◽  
Keliang Wang ◽  
Victor F. Neto ◽  
Bárbara Gabriel ◽  
...  
Keyword(s):  
Plasma Treatment ◽  
Active Carbon ◽  
Saline Water ◽  
Carbon Film ◽  
Absorption Capacity ◽  
Rf Plasma ◽  
Capacitive Deionization ◽  
Capacitively Coupled ◽  
Electrochemical Double Layer ◽  
Carbon Film Electrode

The plasma treatment on commercial active carbon (AC) was carried out in a capacitively coupled plasma system using Ar + 10% O2 at pressure of 4.0 Torr. The RF plasma power ranged from 50 W to 100 W and the processing time was 10 min. The carbon film electrode was fabricated by electrophoretic deposition. Micro-Raman spectroscopy revealed the highly increased disorder of sp2 C lattice for the AC treated at 75 W. An electrosorption capacity of 6.15 mg/g was recorded for the carbon treated at 75 W in a 0.1 mM NaCl solution when 1.5 V was applied for 5 hours, while the capacity of the untreated AC was 1.01 mg/g. The plasma treatment led to 5.09 times increase in the absorption capacity. The jump of electrosorption capacity by plasma treatment was consistent with the Raman spectra and electrochemical double layer capacitance. This work demonstrated that plasma treatment was a potentially efficient approach to activating biochar to serve as electrode material for capacitive deionization (CDI).

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