Investigation Model of Multipurpose Technological Device for Vacuum Plasma Treatment Thin Films Deposited on Band Substrate

Author(s):  
T.B. Generalova ◽  
R.K. Yafarov
2016 ◽  
Author(s):  
Vladimir A. Slabodchikov ◽  
Dmitry P. Borisov ◽  
Vladimir M. Kuznetsov

2008 ◽  
Vol 53 (9(5)) ◽  
pp. 2540-2543 ◽  
Author(s):  
Hooyoung Song ◽  
Jae-Hoon Kim ◽  
EunKyu Kim ◽  
Jaehwan Ha ◽  
JinPyo Hong ◽  
...  

2010 ◽  
Vol 56 (1(2)) ◽  
pp. 388-392 ◽  
Author(s):  
Eui-Jung Yun ◽  
Jin-Woo Jung ◽  
Young-Wook Song ◽  
Hyoung G Nam ◽  
Nam-Ihn Cho

Author(s):  
Kiran Kumar Sappati ◽  
Bishakh Rout ◽  
Pierre-Luc Girard-Lauriault ◽  
Sharmistha Bhadra

2005 ◽  
Vol 11 (S03) ◽  
pp. 162-165 ◽  
Author(s):  
L. von Mühlen ◽  
R. A. Simao ◽  
C. A. Achete

Surface chemistry and topography of materials are generally preponderant factors in a series of material properties, such as adhesion, wettability, friction and optical properties [1]. Wettability of films, for example, can be altered significantly by modifying its surface roughness and also by incorporating functional groups. Plasma treatment is a powerful and versatile way to modify surface properties of amorphous nitrogen-incorporated carbon thin films (a-C:H(N)) and obtain materials with improved properties, once it is possible to modify the surfaces in a controlled way by specific settings of plasma conditions. [2 - 4]


Sign in / Sign up

Export Citation Format

Share Document