A leakage current mechanism caused by the interaction of residual oxidation stress and high-energy ion implantation impact in advanced CMOS technology
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2005 ◽
Vol 44
(9B)
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pp. 6998-7002
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2012 ◽
Vol 12
(7)
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pp. 5347-5350
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1996 ◽
Vol 43
(8)
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pp. 1218-1223
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2016 ◽
Vol 12
(2)
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2016 ◽
Vol 12
(2)
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pp. 232-236
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