A leakage current mechanism caused by the interaction of residual oxidation stress and high-energy ion implantation impact in advanced CMOS technology

1999 ◽  
Vol 20 (5) ◽  
pp. 251-253 ◽  
Author(s):  
Hyeokjac Lee ◽  
Jeong Mo Hwang ◽  
Young June Park ◽  
Hong Shick Min
2020 ◽  
Vol 67 (7) ◽  
pp. 1381-1389
Author(s):  
C. Martinella ◽  
T. Ziemann ◽  
R. Stark ◽  
A. Tsibizov ◽  
K. O. Voss ◽  
...  

2005 ◽  
Vol 44 (9B) ◽  
pp. 6998-7002 ◽  
Author(s):  
Yuji Noguchi ◽  
Masayuki Soga ◽  
Masatake Takahashi ◽  
Masaru Miyayama

1990 ◽  
Author(s):  
T. Kuroi ◽  
S. Komori ◽  
H. Miyatake ◽  
K. Tsukamoto ◽  
Y. Akasaka

Author(s):  
Anati Syahirah Hedzir ◽  
Norasmahan Muridan ◽  
Nurul Fadzlin Hasbullah

We review the dominant mechanism and characteristics of it which gave rise to the existence of forward and reverse leakage current in nitride based light emitting diode (LED). LED is one of the promising device to be used as a lighting source because it does not contain mercury unlike fluorescent lamps. However, the existence of leakage current can affect the reliability and efficiency of LED. Hence, its importance to understand the mechanism that responsible for its existence. The occurrence of leakage current is divided into three main parameters: 1) low bias; 2) medium or high bias; 3) temperature dependence. In low reverse bias, Poole-Frenkel is the dominant mechanism while tunneling is the dominant mechanism in high bias region. Furthermore, in forward bias, defect assisted tunneling is most likely the dominant mechanism. In low forward bias, electrons are the dominant carriers in defect assisted tunneling while in medium forward bias, holes are the dominant carriers.  Moreover, Variable Range Hopping (VRH) is reported to be dominant when the temperature of conduction is below 200K. 


2016 ◽  
Vol 12 (2) ◽  
pp. 232-236 ◽  
Author(s):  
Apurba Chakraborty ◽  
Saptarsi Ghosh ◽  
Partha Mukhopadhyay ◽  
Sanjay K. Jana ◽  
Syed Mukulika Dinara ◽  
...  

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