Effect of Schottky barrier alteration on the low-frequency noise of InP-based HEMTs

1998 ◽  
Vol 19 (10) ◽  
pp. 370-372 ◽  
Author(s):  
H. Van Meer ◽  
M. Valenza ◽  
K. Van Der Zanden ◽  
W. De Raedt ◽  
E. Simeon ◽  
...  
2012 ◽  
Vol 12 (9) ◽  
pp. 2824-2829 ◽  
Author(s):  
Tse-Pu Chen ◽  
Sheng-Joue Young ◽  
Shoou-Jinn Chang ◽  
Bohr-Ran Huang ◽  
Shih-Ming Wang ◽  
...  

2020 ◽  
Vol 217 (17) ◽  
pp. 1900880
Author(s):  
Jiseok Kwon ◽  
Collin J. Delker ◽  
David B. Janes ◽  
Charles T. Harris ◽  
Suprem R. Das

2019 ◽  
Vol 49 (1) ◽  
pp. 297-305 ◽  
Author(s):  
P. R. Sekhar Reddy ◽  
V. Janardhanam ◽  
Hoon-Ki Lee ◽  
Kyu-Hwan Shim ◽  
Sung-Nam Lee ◽  
...  

2020 ◽  
pp. 2150134
Author(s):  
Ya-Yi Chen ◽  
Yuan Liu ◽  
Yuan Ren ◽  
Zhao-Hui Wu ◽  
Li Wang ◽  
...  

In this paper, the forward bias conduction and low frequency noise (LFN) characteristics of GaN Schottky barrier diodes (SBDs) have been measured and studied in the temperature range from 300 K to 450 K. Based on I–V measured results, the temperature dependence of ideality factor and zero bias Schottky barrier height reveals the inhomogeneities of Schottky barriers at the metal-semiconductor (MS) interface. Further study of the LFN measured results shows that the flicker noise ([Formula: see text] noise) is the main component of LFN in GaN SBDs. The current dependence of LFN indicates the influences of the Schottky barrier and the series resistance on [Formula: see text] noise, and the temperature dependence of LFN is analyzed according to Luo’s model and the barrier inhomogeneities model.


1996 ◽  
Vol 420 ◽  
Author(s):  
K. Aflatooni ◽  
A. Nathan ◽  
R. Hornsey

AbstractWe present a systematic experimental study of low frequency noise behavior in Mo/a-Si:H Schottky diodes under reverse bias operation. The noise in the Schottky diode was found to increase with increasing reverse current and with an approximate 1/f behavior at low bias voltages, yielding a Hooge parameter in the range (2 to 3) × 10−4. At high reverse voltages, due to electrical stressing and hence, bias-induced material instability, a significant deviation from the 1/f behavior was observed.


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