The deposition of TiN thin films by filtered cathodic arc techniques

1997 ◽  
Vol 25 (4) ◽  
pp. 675-679 ◽  
Author(s):  
P.J. Martin ◽  
A. Bendavid ◽  
T.J. Kinder
Keyword(s):  
Thin Films ◽  
Tin Thin Films ◽  
Cathodic Arc

The deposition of TiN thin films by nitrogen ion assisted deposition of Ti from a filtered cathodic arc source

1996 ◽  
Vol 86-87 ◽  
pp. 271-278 ◽  
Author(s):  
P.J. Martin ◽  
A. Bendavid ◽  
T.J. Kinder ◽  
L. Wielunski
Keyword(s):  
Thin Films ◽  
Tin Thin Films ◽  
Nitrogen Ion ◽  
Cathodic Arc

scholarly journals Correlating point defects with mechanical properties in nanocrystalline TiN thin films

2021 ◽  
pp. 109844
Author(s):  
Zaoli Zhang ◽  
Arsham Ghasemi ◽  
Nikola Koutná ◽  
Zhen Xu ◽  
Thomas Grünstäudl ◽  
...  
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Point Defects ◽  
Tin Thin Films

Study on Arc Ion Plating Nitride Films of Microscopic Morphology and Micro-Hardness

2011 ◽  
Vol 306-307 ◽  
pp. 274-279
Author(s):  
Qing Tao ◽  
Yan Wei Sui ◽  
Sun Zhi ◽  
Wei Song
Keyword(s):  
Thin Films ◽  
Steel Substrate ◽  
Nitride Film ◽  
Composition Analysis ◽  
Micro Hardness ◽  
Arc Ion Plating ◽  
Ion Plating ◽  
Tin Thin Films ◽  
Research Procedure ◽  
Microscopic Morphology

AlN and TiN thin films are widely used in electronic devices and acoustic material and other fields because of its unique merit, the preparation of nitride thin films by using the arc ion plating has not been a systematic and deep study. The article presents our research procedure which the AlN and TiN thin films are deposited on stainless steel substrate by arc ion plating (AIP). The characteristics of thin films, for example microstructure, morphology, composition analysis and hardness, are examined and analyzed. The results showed that: Droplet-like particles appear in the microstructure of nitride thin films, and the grain size of droplet-like particles in AlN thin films is greater than in TiN thin films. The micro-hardness of nitride films preparation in experiment has improved significantly, and establish firmly basic for extending the application field of nitride film.

Effect of NH3 flow on electrical and mechanical properties of ALD TiN thin films

2021 ◽  
Vol 291 ◽  
pp. 129554
Author(s):  
Hyunchol Cho ◽  
Ben Nie ◽  
Ajit Dhamdhere ◽  
Yifei Meng ◽  
Monica Neuburger ◽  
...  
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Tin Thin Films
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