Optical properties of fluorinated silicon oxide films by liquid phase deposition for optical waveguides

1998 ◽  
Vol 47 (3) ◽  
pp. 698-702 ◽  
Author(s):  
T. Homma ◽  
A. Satoh ◽  
S. Okada ◽  
M. Itoh ◽  
M. Yamaguchi ◽  
...  
Keyword(s):  
Optical Properties ◽  
Liquid Phase ◽  
Optical Waveguides ◽  
Silicon Oxide ◽  
Oxide Films ◽  
Liquid Phase Deposition ◽  
Fluorinated Silicon Oxide

Optical Properties of Fluorinated Silicon Oxide and Organic Spin-on-Glass Films for Thin-Film Optical Waveguides

2000 ◽  
Vol 147 (3) ◽  
pp. 1141 ◽  
Author(s):  
Tetsuya Homma ◽  
Yuhji Ariyama ◽  
Hiroyasu Kondo ◽  
Masaya Sakamoto ◽  
Shigeru Kanegae ◽  
...  
Keyword(s):  
Thin Film ◽  
Optical Properties ◽  
Optical Waveguides ◽  
Silicon Oxide ◽  
Fluorinated Silicon Oxide ◽  
Glass Films

Newly Developed Low-K and Low-Stress Fluorinated Silicon Oxide Utilizing Temperature-Difference Liquid-Phase Deposition Technology

1998 ◽  
Vol 511 ◽  
Author(s):  
Ching-Fa Yeh ◽  
Yueh-Chuan Lee ◽  
Su-Chen Lee
Keyword(s):  
Liquid Phase ◽  
Temperature Difference ◽  
Moisture Absorption ◽  
Silicon Oxide ◽  
Liquid Phase Deposition ◽  
High Concentration ◽  
Real Process ◽  
Fluorinated Silicon Oxide ◽  
Intermetal Dielectric ◽  
Low K

ABSTRACTTo meet the requirements of low-K and low-stress intermetal dielectric (IMD) for future ULSI devices, a novel temperature-difference liquid-phase deposition (TD-LPD) method is proposed. The deposition solution of supersaturated silicic acid with high concentration of fluorine can be achieved by raising deposition temperature larger than 15 °C from dissolution temperature (0 °C). Because fluorine atoms can easily be incorporated with the technique, TDLPD fluorine-doped SiO2 (FSG) exhibits low-K (∼3.4) and low-stress (∼40MPa) property. In this paper, to study the interaction between TD-LPD FSG and moisture, the FSG is annealed and moisture stressed repeatedly as in a real process. Since K is sensitive to moisture absorption, and the stress is sensitive to the dehydration reaction between Si-OH's, the both are monitored as indices. A feasible mechanism is proposed to explain the variation in K/stress during annealing and boiling cycles.

Surface modification of spin-on-glass film by liquid-phase deposition of fluorinated silicon oxide

2001 ◽  
Vol 392 (1) ◽  
pp. 107-112
Author(s):  
Tetsuya Homma ◽  
Hiroyasu Kondo ◽  
Kazuaki Inohara ◽  
Masahiro Nomoto ◽  
Masaya Sakamoto ◽  
...  
Keyword(s):  
Surface Modification ◽  
Liquid Phase ◽  
Silicon Oxide ◽  
Glass Film ◽  
Liquid Phase Deposition ◽  
Fluorinated Silicon Oxide

Deposition of Metal Oxide Films at Liquid−Liquid Interface by the Liquid Phase Deposition Method

2008 ◽  
Vol 112 (35) ◽  
pp. 13535-13539 ◽  
Author(s):  
Shigehito Deki ◽  
Akiyoshi Nakata ◽  
Yasuyuki Sakakibara ◽  
Minoru Mizuhata
Keyword(s):  
Liquid Phase ◽  
Metal Oxide ◽  
Oxide Films ◽  
Liquid Interface ◽  
Liquid Phase Deposition ◽  
Deposition Method ◽  
Metal Oxide Films

Optical properties of periodically inhomogeneous silicon oxide films

1976 ◽  
Vol 34 (2) ◽  
pp. 411-415 ◽  
Author(s):  
A. Lutter ◽  
J. Rónaky
Keyword(s):  
Optical Properties ◽  
Silicon Oxide ◽  
Oxide Films

The Optical Properties of Ammonia Treated TiO2 Nanostructure Prepared by Liquid Phase Deposition Method

2011 ◽  
Vol 364 ◽  
pp. 470-474
Author(s):  
Siti Khatijah Md Saad ◽  
Akrajas Ali Umar ◽  
Mohd Yusri Abd Rahman ◽  
Muhamad Mat Salleh
Keyword(s):  
Optical Properties ◽  
Solar Cell ◽  
Liquid Phase ◽  
Nitrogen Doping ◽  
Uv Light ◽  
Visible Region ◽  
Liquid Phase Deposition ◽  
Paper Report ◽  
Solar Cell Application ◽  
Percentage Concentration

. TiO2 was known for its potential in solar cell and photocatalyst application. However the usage of anatase TiO2 in solar cell application has its own disadvantage as TiO2 spectrum was limited to ultraviolet (UV) light limiting its application. It was found that the broader optical absorption of TiO2 can be obtained by nitrogen doping. This paper report the optical properties study of ammonia treated TiO2 nanostructures with various percentage concentration of ammonia. The TiO2 nanostructures was prepared by liquid phase deposition (LPD) method using on ITO substrate and annealed at 450 °C for 1h. The TiO2 nanostructures were characterized with rod-like morphology with length and diameter of ca. 100 nm and ca. 100 nm respectively that vertically oriented on the surface. The optical properties of the samples exhibit strong band near the UV region. The optical properties drastically changed if the samples treated with ammonia, of which exhibit the present of broader absorption band in the visible region. The TiO2 treated ammonia should be find used in photoelectrochemical (PEC) solar cell application.

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