Use of porous silicon antireflection coating in multicrystalline silicon solar cell processing

1999 ◽  
Vol 46 (10) ◽  
pp. 2035-2040 ◽  
Author(s):  
R.R. Bilyalov ◽  
L. Stalmans ◽  
L. Schirone ◽  
C. Levy-Clement
Keyword(s):  
Solar Cell ◽  
Porous Silicon ◽  
Silicon Solar Cell ◽  
Antireflection Coating ◽  
Multicrystalline Silicon ◽  
Cell Processing

Optimization of DLC/PS Antireflection Coating Properties for Multicrystalline Silicon Solar Cells

2009 ◽  
Vol 609 ◽  
pp. 179-182 ◽  
Author(s):  
Kahina Ait-Hamouda ◽  
A. Ababou ◽  
N. Gabouze
Keyword(s):  
Solar Cell ◽  
Porous Silicon ◽  
Spectral Response ◽  
Silicon Layer ◽  
Chemical Vapor ◽  
Antireflection Coating ◽  
Porous Silicon Layer ◽  
Electrochemical Process ◽  
Multicrystalline Silicon ◽  
Cell Parameters

In this work, we report on the results of using a Diamond-Like Carbon / Porous Silicon (DLC/PS) double layer as antireflection coating to enhance the performance of multicrystalline silicon photovoltaic cells. DLC layers were obtained by Plasma Enhanced Chemical Vapor Deposition (PECVD) method. The properties of these layers were investigated in order to establish the optimum preparation conditions for solar cell applications. Then, thin films of combined porous silicon-DLC structure were fabricated for antireflection coating use. The spectral response of a solar cell based on multicrystalline silicon (mc-Si) coated with a PS layer, formed by electrochemical process was enhanced compared to a cell without porous silicon layer as emitter. Further improvements are obtained by a deposition of a thin DLC film. The results of the solar cell parameters before and after porous silicon formation and DLC coating are discussed.

scholarly journals Application of CBD-Zinc Sulfide Film as an Antireflection Coating on Very Large Area Multicrystalline Silicon Solar Cell

2007 ◽  
Vol 2007 ◽  
pp. 1-5 ◽  
Author(s):  
U. Gangopadhyay ◽  
K. Kim ◽  
S. K. Dhungel ◽  
H. Saha ◽  
J. Yi
Keyword(s):  
Refractive Index ◽  
Solar Cells ◽  
Solar Cell ◽  
Silicon Solar Cell ◽  
Low Cost ◽  
Antireflection Coating ◽  
Film Deposition ◽  
Multicrystalline Silicon ◽  
Silicon Solar Cells ◽  
Large Area

The low-cost chemical bath deposition (CBD) technique is used to prepare CBD-ZnS films as antireflective (AR) coating for multicrystalline silicon solar cells. The uniformity of CBD-ZnS film on large area of textured multicrystalline silicon surface is the major challenge of CBD technique. In the present work, attempts have been made for the first time to improve the rate of deposition and uniformity of deposited film by controlling film stoichiometry and refractive index and also to minimize reflection loss by proper optimization of molar percentage of different chemical constituents and deposition conditions. Reasonable values of film deposition rate (12.13 Å′/min.), good film uniformity (standard deviation <1), and refractive index (2.35) along with a low percentage of average reflection (6-7%) on a textured mc-Si surface are achieved with proper optimization of ZnS bath. 12.24% efficiency on large area (125 mm × 125 mm) multicrystalline silicon solar cells with CBD-ZnS antireflection coating has been successfully fabricated. The viability of low-cost CBD-ZnS antireflection coating on large area multicrystalline silicon solar cell in the industrial production level is emphasized.

scholarly journals Superior Antireflection Coating for a Silicon Cell with a Micronanohybrid Structure

2014 ◽  
Vol 2014 ◽  
pp. 1-8 ◽  
Author(s):  
Hsi-Chien Liu ◽  
Gou-Jen Wang
Keyword(s):  
Solar Cell ◽  
Silicon Solar Cell ◽  
Low Cost ◽  
Antireflection Coating ◽  
Light Spectrum ◽  
Two Stage ◽  
Liquid Diffusion ◽  
Pyramid Structure ◽  
Short Time ◽  
Structure Array

The object of this paper is to develop a high antireflection silicon solar cell. A novel two-stage metal-assisted etching (MAE) method is proposed for the fabrication of an antireflective layer of a micronanohybrid structure array. The processing time for the etching on an N-type high-resistance (NH) silicon wafer can be controlled to around 5 min. The resulting micronanohybrid structure array can achieve an average reflectivity of 1.21% for a light spectrum of 200–1000 nm. A P-N junction on the fabricated micronanohybrid structure array is formed using a low-cost liquid diffusion source. A high antireflection silicon solar cell with an average efficiency of 13.1% can be achieved. Compared with a conventional pyramid structure solar cell, the shorted circuit current of the proposed solar cell is increased by 73%. The major advantage of the two-stage MAE process is that a high antireflective silicon substrate can be fabricated cost-effectively in a relatively short time. The proposed method is feasible for the mass production of low-cost solar cells.

Role of metal impurities in multicrystalline silicon solar cell degradation

2021 ◽  
Vol 14 (11) ◽  
pp. 115502
Author(s):  
Zechen Hu ◽  
Dehang Lin ◽  
Xuegong Yu ◽  
Christoph Seiffert ◽  
Andrej Kuznetsov ◽  
...  
Keyword(s):  
Solar Cell ◽  
Silicon Solar Cell ◽  
Multicrystalline Silicon ◽  
Metal Impurities
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