Study of electrochemical etch-stop for high-precision thickness control of silicon membranes

1989 ◽  
Vol 36 (4) ◽  
pp. 663-669 ◽  
Author(s):  
B. Kloeck ◽  
S.D. Collins ◽  
N.F. de Rooij ◽  
R.L. Smith
Keyword(s):  
High Precision ◽  
Thickness Control ◽  
Etch Stop ◽  
Silicon Membranes

High-precision thickness control of ice layer on CVD grown bilayer graphene for cryo-TEM

Carbon ◽  
2020 ◽  
Vol 160 ◽  
pp. 107-112 ◽  
Author(s):  
Ryuichi Kato ◽  
Yuri Hatano ◽  
Naoki Kasahata ◽  
Chikara Sato ◽  
Kazu Suenaga ◽  
...  
Keyword(s):  
High Precision ◽  
Bilayer Graphene ◽  
Thickness Control

Research for the Resonator Structure Process Technology of Resonant Pressure Sensors

2014 ◽  
Vol 609-610 ◽  
pp. 1020-1022
Author(s):  
Zheng Yuan Zhang ◽  
Yang Cao ◽  
Yong Mei ◽  
Jian Gen Li ◽  
Zhi Cheng Feng
Keyword(s):  
Surface Roughness ◽  
High Precision ◽  
Silicon Substrate ◽  
Pressure Sensors ◽  
Structure Design ◽  
Process Technology ◽  
Design And Optimization ◽  
Resonator Structure ◽  
Etch Stop ◽  
Koh Etching

The fabrication of butterfly-shape resonator is key for high precision resonator, for requiring suspend on the silicon substrate. This paper is focused on the technology of making butterfly-shape resonator. the variety of structure design can be used to make butterfly-shape resonator have been analyzed, the structure of butterfly-shape resonator is obtained, and for reducing the etch surface roughness, KOH etching conditions, such as composition, concentration, and temperature of etch solution, have been done. Combining with above testing results, the structure design and optimization KOH etching technology are obtained ,based on the technology, using the boron etch stop technique , the silicon butterfly-shape resonator has been done, it can be used effectively in the fabrication of the silicon resonant sensor.

scholarly journals Study on a High Performance MEMS Infrared Thermopile Detector

Micromachines ◽  
2019 ◽  
Vol 10 (12) ◽  
pp. 877 ◽  
Author(s):  
Aida Bao ◽  
Cheng Lei ◽  
Haiyang Mao ◽  
Ruirui Li ◽  
Yihao Guan
Keyword(s):  
Response Time ◽  
High Precision ◽  
Temperature Sensor ◽  
High Performance ◽  
Infrared Detector ◽  
Isotropic Etching ◽  
Vacuum Sensor ◽  
Precision Temperature ◽  
Etch Stop ◽  
Measured Response

This paper presents a high-performance micro-electromechanical systems (MEMS) thermopile infrared detector. It consists of a double-end beam and a dual-layer thermocouple structure, which improves the responsivity of the detector. The etch-stop structure is integrated into the detector to prevent isotropic etching-caused damage on the device. The responsivity of the detector achieved 1151.14 V/W, and the measured response time was 14.46 ms. The detector had the potential to work as a high-precision temperature sensor and as a vacuum sensor.

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