scholarly journals Molecular Interactions between the Specialist HerbivoreManduca sexta (Lepidoptera, Sphingidae) and Its Natural Host Nicotiana attenuata: V. Microarray Analysis and Further Characterization of Large-Scale Changes in Herbivore-Induced mRNAs

2003 ◽  
Vol 131 (4) ◽  
pp. 1877-1893 ◽  
Author(s):  
Dequan Hui ◽  
Javeed Iqbal ◽  
Katja Lehmann ◽  
Klaus Gase ◽  
Hans Peter Saluz ◽  
...  
Keyword(s):  
Microarray Analysis ◽  
Molecular Interactions ◽  
Large Scale ◽  
Natural Host ◽  
Nicotiana Attenuata

scholarly journals Molecular Interactions between the Specialist Herbivore Manduca sexta (Lepidoptera, Sphingidae) and Its Natural Host Nicotiana attenuata. VII. Changes in the Plant's Proteome

2006 ◽  
Vol 142 (4) ◽  
pp. 1621-1641 ◽  
Author(s):  
Ashok P. Giri ◽  
Hendrik Wünsche ◽  
Sirsha Mitra ◽  
Jorge A. Zavala ◽  
Alexander Muck ◽  
...  
Keyword(s):  
Manduca Sexta ◽  
Molecular Interactions ◽  
Natural Host ◽  
Nicotiana Attenuata ◽  
Specialist Herbivore

Some applications of electron beam microanalysis techniques in VLSI process evaluation

1983 ◽  
Vol 41 ◽  
pp. 160-161
Author(s):  
Simon Thomas
Keyword(s):  
Integrated Circuits ◽  
Process Evaluation ◽  
Large Scale ◽  
Technology Development ◽  
Analytical Techniques ◽  
Successful Implementation ◽  
Analysis Of Failures ◽  
Characterization Of Materials ◽  
Circuits Vlsi

Trends in the technology development of very large scale integrated circuits (VLSI) have been in the direction of higher density of components with smaller dimensions. The scaling down of device dimensions has been not only laterally but also in depth. Such efforts in miniaturization bring with them new developments in materials and processing. Successful implementation of these efforts is, to a large extent, dependent on the proper understanding of the material properties, process technologies and reliability issues, through adequate analytical studies. The analytical instrumentation technology has, fortunately, kept pace with the basic requirements of devices with lateral dimensions in the micron/ submicron range and depths of the order of nonometers. Often, newer analytical techniques have emerged or the more conventional techniques have been adapted to meet the more stringent requirements. As such, a variety of analytical techniques are available today to aid an analyst in the efforts of VLSI process evaluation. Generally such analytical efforts are divided into the characterization of materials, evaluation of processing steps and the analysis of failures.

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