Enhanced production of negative ions in low-pressure hydrogen and deuterium discharges

1991 ◽  
Vol 67 (4) ◽  
pp. 449-452 ◽  
Author(s):  
Michael B. Hopkins ◽  
Kevin N. Mellon
Keyword(s):  
Negative Ions ◽  
Low Pressure ◽  
Enhanced Production ◽  
Pressure Hydrogen

scholarly journals Effect of Low-Pressure Plasma Treatment Parameters on Wrinkle Features

Materials ◽  
2020 ◽  
Vol 13 (17) ◽  
pp. 3852
Author(s):  
Bongjun Gu ◽  
Dongwook Ko ◽  
Sungjin Jo ◽  
Dong Choon Hyun ◽  
Hyeon-Ju Oh ◽  
...  
Keyword(s):  
Power Flow ◽  
Treatment Time ◽  
Argon Plasma ◽  
Negative Ions ◽  
Low Pressure ◽  
Nitrogen Plasma ◽  
Pressure Plasma ◽  
Positive Ions ◽  
Low Pressure Plasma ◽  
Optical Adhesive

Wrinkles attract significant attention due to their ability to enhance the mechanical and optical characteristics of various optoelectronic devices. We report the effect of the plasma gas type, power, flow rate, and treatment time on the wrinkle features. When an optical adhesive was treated using a low-pressure plasma of oxygen, argon, and nitrogen, the oxygen and argon plasma generated wrinkles with the lowest and highest wavelengths, respectively. The increase in the power of the nitrogen and oxygen plasma increased the wavelengths and heights of the wrinkles; however, the increase in the power of the argon plasma increased the wavelengths and decreased the heights of the wrinkles. Argon molecules are heavier and smaller than nitrogen and oxygen molecules that have similar weights and sizes; moreover, the argon plasma comprises positive ions while the oxygen and nitrogen plasma comprise negative ions. This resulted in differences in the wrinkle features. It was concluded that a combination of different plasma gases could achieve exclusive control over either the wavelength or the height and allow a thorough analysis of the correlation between the wrinkle features and the characteristics of the electronic devices.

Capturing low-pressure hydrogen using V Ti Cr catalyzed magnesium hydride

2019 ◽  
Vol 413 ◽  
pp. 139-147 ◽  
Author(s):  
Chengshang Zhou ◽  
Zhigang Zak Fang ◽  
Pei Sun ◽  
Lei Xu ◽  
Yong Liu
Keyword(s):  
Low Pressure ◽  
Magnesium Hydride ◽  
Pressure Hydrogen

Impact of Backend Processing on Integrated Ferroelectric Capacitor Characteristics

1993 ◽  
Vol 310 ◽  
Author(s):  
P.D. Maniar ◽  
R. Moazzami ◽  
R.E. Jones ◽  
A.C. Campbell ◽  
C.J. Mogab
Keyword(s):  
Leakage Current ◽  
Sol Gel ◽  
Low Pressure ◽  
Cmos Process ◽  
Ferroelectric Capacitor ◽  
Standard Cmos Process ◽  
Order Of Magnitude ◽  
Pressure Hydrogen

AbstractIntegration of a ferroelectric capacitor module in a standard CMOS process subjects the ferroelectric to various ambients during backend processing, some of which can render the ferroelectric essentially non-operational for NVRAM applications. Post-crystallization processing of sol-gel deposited integrated ferroelectric PZT capacitors in the presence of hydrogen-containing, reducing ambients is observed to degrade the nonvolatile polarization. Low-pressure hydrogen anneals at temperatures as low as 200°C substantially degrade the nonvolatile polarization while the DRAM polarization remains roughly constant. Leakage current drops by one order of magnitude and fatigue is accelerated. A ferroelectric capacitor module can be integrated with minimal degradation with careful modifications in the backend processing.

Characterization and global modelling of low-pressure hydrogen-based RF plasmas suitable for surface cleaning processes

2013 ◽  
Vol 46 (47) ◽  
pp. 475206 ◽  
Author(s):  
Nikola Škoro ◽  
Nevena Puač ◽  
Saša Lazović ◽  
Uroš Cvelbar ◽  
George Kokkoris ◽  
...  
Keyword(s):  
Low Pressure ◽  
Surface Cleaning ◽  
Rf Plasmas ◽  
Global Modelling ◽  
Pressure Hydrogen

scholarly journals Application of low-temperature low-pressure hydrogen plasma: treatment of artificially prepared corrosion layers

2014 ◽  
Vol 13 (1) ◽  
Author(s):  
Petra Fojtíková ◽  
Lucie Řádková ◽  
Drahomíra Janová ◽  
František Krčma
Keyword(s):  
Low Temperature ◽  
Chemical Reduction ◽  
Hydrogen Plasma ◽  
Optical Emission ◽  
Low Pressure ◽  
Oh Radicals ◽  
Plasma Chemical ◽  
Duty Cycles ◽  
Fundamental Research ◽  
Pressure Hydrogen

AbstractThe aim of this work is the application of low-temperature low-pressure hydrogen plasma on artificially prepared corrosion layers, so called plasma chemical reduction. It is necessary to use samples with artificially prepared corrosion layers because it is impossible to use the real artifacts for fundamental research. The bronze was chosen as a sample material. Formation of corrosion layers on the bronze samples was carried out in concentrated hydrochloric acid vapors with the addition of sand. The radio-frequency hydrogen plasma was generated in the flowing regime at a pressure of 160 Pa. Different values of supplied power were chosen as well as different discharge modes: continuous or pulsed mode with varied duty cycles. By the combination of supplied power and mode factors, we selected two values of effective power. The process of plasma chemical reduction was monitored by optical emission spectroscopy (OES) and simultaneously, the sample temperature was measured. Rotational temperatures were calculated from OH radicals spectra. Changes in the structure and elemental composition were determined using scanning electron microscopy (SEM) and energy dispersive X-ray analysis (EDX).

Comparative photoemission study of low-pressure hydrogen, silane, and disilane adsorption on Si(111)7×7

1990 ◽  
Vol 41 (6) ◽  
pp. 3878-3881 ◽  
Author(s):  
J. J. Koulmann ◽  
F. Ringeisen ◽  
M. Alaoui ◽  
D. Bolmont
Keyword(s):  
Low Pressure ◽  
Photoemission Study ◽  
Pressure Hydrogen
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