Spin relaxation through lateral spin transport in heavily doped n -type silicon

2017 ◽  
Vol 95 (11) ◽  
Author(s):  
M. Ishikawa ◽  
T. Oka ◽  
Y. Fujita ◽  
H. Sugiyama ◽  
Y. Saito ◽  
...  
1996 ◽  
Vol 35 (Part 1, No. 7) ◽  
pp. 3937-3941 ◽  
Author(s):  
Naoki Fukata ◽  
Shinichi Sasaki ◽  
Shuzo Fujimura ◽  
Hajime Haneda ◽  
Kouichi Murakami

Small ◽  
2014 ◽  
pp. n/a-n/a ◽  
Author(s):  
Saumil Bandyopadhyay ◽  
Md. Iftekhar Hossain ◽  
Hasnain Ahmad ◽  
Jayasimha Atulasimha ◽  
Supriyo Bandyopadhyay

1979 ◽  
Vol 56 (2) ◽  
pp. K109-K112
Author(s):  
Y. Ochiai ◽  
E. Matsuura

2007 ◽  
Vol 75 (7) ◽  
Author(s):  
H. Saarikoski ◽  
W. Wetzels ◽  
G. E. W. Bauer

1991 ◽  
Vol 234 ◽  
Author(s):  
Cronin B. Vining

ABSTRACTA model is presented for the high temperature transport properties of large grain size, heavily doped p-type silicon-germanium alloys. Good agreement with experiment (±10%) is found by considering acoustic phonon and ionized impurity scattering for holes and phonon-phonon, point defect and hole-phonon scattering for phonons. Phonon scattering by holes is found to be substantially weaker than phonon scattering by electrons, which accounts for the larger thermal conductivity values of ptype silicon-germanium alloys compared to similarly doped n-type silicongermanium alloys. The relatively weak scattering of long-wavelength phonons by holes raises the possibility that p-type silicon-germanium alloys may be improved for thermoelectric applications by the addition of an additional phonon scattering mechanism which is effective on intermediate and long-wavelength phonons. Calculations indicate improvements in the thermoelectric figure of merit up to 40% may be possible by incorporating several volume percent of 20 Å radius inclusions into p-type silicon-germanium alloys.


1966 ◽  
Vol 4 (3) ◽  
pp. 111-114 ◽  
Author(s):  
M. Balkanski ◽  
A. Geismar

2017 ◽  
Vol 8 (1) ◽  
Author(s):  
Y. Fujita ◽  
M. Yamada ◽  
M. Tsukahara ◽  
T. Oka ◽  
S. Yamada ◽  
...  
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