Heat transport across a SiGe nanowire axial junction: Interface thermal resistance and thermal rectification

2014 ◽  
Vol 90 (4) ◽  
Author(s):  
Riccardo Rurali ◽  
Xavier Cartoixà ◽  
Luciano Colombo
2007 ◽  
Vol 21 (23n24) ◽  
pp. 4013-4016 ◽  
Author(s):  
JINGHUA LAN ◽  
LEI WANG ◽  
BAOWEN LI

By connecting two dissimilar anharmonic lattices exemplified by Fermi-Pasta-Ulam (FPU) model and Frenkel-kontorova (FK) model, we successfully build up one dimensional thermal diode. We find the rectifying effect is closely related to asymmetric interface thermal resistance (Kapitza resistance). And the asymmetric thermal resistance depends on how the temperature gradient is applied. Moreover, a qualitative relationship between the thermal rectification and the phonon spectra is proposed.


2015 ◽  
Vol 46 (2) ◽  
pp. 175-183
Author(s):  
Shuang LUO ◽  
Jun WANG ◽  
Jue WANG ◽  
YuXin ZHU ◽  
GuoDong XIA

Author(s):  
Youngsuk Son ◽  
Monalisa Mazumder ◽  
Theodorian Borca-Tasciuc

Developing a fundamental understanding regarding energy flow across nanoscale interfaces is critical in realizing viable nanoelectronics device systems and efficient low-dimensional thermoelectric devices. This work presents investigations of the interface thermal resistance (ITR) in a nanoelectrode-on-substrate system using the DC heating as well as the 3ω method.


2011 ◽  
Vol 117-119 ◽  
pp. 195-200 ◽  
Author(s):  
Qing Zhi Zhang ◽  
Gang Wu ◽  
Zhi Yang Pang ◽  
Jin Zeng Chen ◽  
Guang Hua Li ◽  
...  

By using the high purity Cu samples as the study objects and based on the experimental measurement results of the interface thermal resistance, the study on the relations between the interface thermal resistance, the laser modulation frequency and the phase lag under different temperatures has been carried out through the Matlab numerical simulation. It is shown that the corresponding phase lag is increasingly bigger but the interface thermal resistance is increasingly smaller while the interface temperature become higher at a certain pressure; furthermore, the study on relation between the interface thermal resistance and the temperature variation has been carried out and it may be concluded based on the analysis that the interface thermal resistance changes remarkably while the temperature scope is from 20K to 60K and the interface thermal resistance varies slightly while the temperature scope is from 60K to 120K.


2006 ◽  
Vol 3 (5) ◽  
pp. 1343-1346
Author(s):  
Yuri M. Nikolaenko ◽  
Yuri V. Medvedev ◽  
Yuri A. Genenko ◽  
Mohammad Ghafari ◽  
Horst Hahn

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