scholarly journals Surface-directed spinodal decomposition in hafnium silicate thin films

2009 ◽  
Vol 80 (4) ◽  
Author(s):  
J. Liu ◽  
X. Wu ◽  
W. N. Lennard ◽  
D. Landheer
Keyword(s):  
Thin Films ◽  
Spinodal Decomposition ◽  
Hafnium Silicate

Spinodal decomposition of Ti0.33Al0.67N thin films studied by atom probe tomography

2012 ◽  
Vol 520 (13) ◽  
pp. 4362-4368 ◽  
Author(s):  
L.J.S. Johnson ◽  
M. Thuvander ◽  
K. Stiller ◽  
M. Odén ◽  
L. Hultman
Keyword(s):  
Thin Films ◽  
Spinodal Decomposition ◽  
Atom Probe Tomography ◽  
Atom Probe

scholarly journals Thin films of Co1.7Fe1.3O4 prepared by radio frequency sputtering – the first step towards their spinodal decomposition

CrystEngComm ◽  
2014 ◽  
Vol 16 (16) ◽  
pp. 3359-3365 ◽  
Author(s):  
T. M. A. Bui ◽  
H. Le Trong ◽  
L. Presmanes ◽  
A. Barnabé ◽  
C. Bonningue ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Radio Frequency ◽  
Spinodal Decomposition ◽  
Radio Frequency Sputtering

Co1.7Fe1.3O4 thin films are submitted to spinodal transformation after annealing at low temperature.

scholarly journals Spinodal Decomposition of Geometrically Constrained CuNiFe Thin Films

2006 ◽  
Vol 12 (S02) ◽  
pp. 522-523
Author(s):  
JT McKeown ◽  
JD Sugar ◽  
V Radmilovic ◽  
AM Glaeser ◽  
R Gronsky
Keyword(s):  
Thin Films ◽  
Spinodal Decomposition ◽  
Geometrically Constrained

Extended abstract of a paper presented at Microscopy and Microanalysis 2006 in Chicago, Illinois, USA, July 30 – August 3, 2006

scholarly journals Magnetic-field-induced spontaneous superlattice formation via spinodal decomposition in epitaxial strontium titanate thin films

2016 ◽  
Vol 8 (6) ◽  
pp. e279-e279 ◽  
Author(s):  
Naoki Wakiya ◽  
Naonori Sakamoto ◽  
Shota Koda ◽  
Wataru Kumasaka ◽  
Nipa Debnath ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Thin Films ◽  
Spinodal Decomposition ◽  
Strontium Titanate

Nitridation of Hafnium Silicate Thin Films

2004 ◽  
Vol 811 ◽  
Author(s):  
Hood Chatham ◽  
Yoshi Senzaki ◽  
Jeff Bailey ◽  
Wesley Nieveen
Keyword(s):  
Thin Films ◽  
Photoelectron Spectroscopy ◽  
Nitrogen Concentration ◽  
Nitrogen Plasma ◽  
Process Conditions ◽  
Atomic Nitrogen ◽  
Hafnium Silicate ◽  
X Ray ◽  
Nitrogen Concentrations ◽  
Nitridation Temperature

ABSTRACTWe discuss the nitridation of ALD-deposited hafnium silicate films by exposure to atomic nitrogen generated in a remote nitrogen plasma. Nitrogen concentration [N] as measured by X-ray photoelectron spectroscopy (XPS) is determined as a function of the nitridation temperature and other process conditions. Nitrogen concentrations up to 13.7 atomic % were achieved.

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