Electrostatic forces in atomic force microscopy

2002 ◽  
Vol 66 (3) ◽  
Author(s):  
B. M. Law ◽  
F. Rieutord
2000 ◽  
Vol 10 (1-2) ◽  
pp. 15
Author(s):  
Eugene Sprague ◽  
Julio C. Palmaz ◽  
Cristina Simon ◽  
Aaron Watson

2014 ◽  
Vol 112 (16) ◽  
Author(s):  
Maximilian Schneiderbauer ◽  
Matthias Emmrich ◽  
Alfred J. Weymouth ◽  
Franz J. Giessibl

2021 ◽  
Author(s):  
Megan Cowie ◽  
Rikke Plougmann ◽  
Yacine Benkirane ◽  
Léonard Schué ◽  
Zeno Schumacher ◽  
...  

Abstract Transition metal dichalcogenides (TMDCs) have attracted significant attention for optoelectronic, photovoltaic and photoelectrochemical applications. The properties of TMDCs are highly dependent on the number of stacked atomic layers, which is usually counted post-fabrication, using a combination of optical methods and atomic force microscopy height measurements. Here, we use photoluminescence spectroscopy, Raman spectroscopy, and three different AFM methods to demonstrate significant discrepancies in height measurements of exfoliated MoSe2 flakes on SiO2 depending on the method used. We also highlight the often overlooked effect that electrostatic forces can be misleading when measuring the height of a MoSe2 flake using AFM.


Small ◽  
2010 ◽  
Vol 6 (19) ◽  
pp. 2105-2108 ◽  
Author(s):  
JiaPeng Xu ◽  
Kwang Joo Kwak ◽  
James L. Lee ◽  
Gunjan Agarwal

2017 ◽  
Vol 28 (6) ◽  
pp. 065704 ◽  
Author(s):  
Nina Balke ◽  
Stephen Jesse ◽  
Ben Carmichael ◽  
M Baris Okatan ◽  
Ivan I Kravchenko ◽  
...  

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