Tunable generation of nanometer-scale corrugations on high-index III-V semiconductor surfaces

1994 ◽  
Vol 49 (16) ◽  
pp. 11053-11059 ◽  
Author(s):  
Eric Tournié ◽  
Richard Nötzel ◽  
Klaus H. Ploog
Keyword(s):  
High Index ◽  
Nanometer Scale ◽  
Semiconductor Surfaces

Overlayer strain: A key to directly tune the topography of high‐index semiconductor surfaces

1993 ◽  
Vol 63 (24) ◽  
pp. 3300-3302 ◽  
Author(s):  
Eric Tournié ◽  
Richard Nötzel ◽  
Klaus H. Ploog
Keyword(s):  
High Index ◽  
Semiconductor Surfaces

Ordered Quantum Dots: A New Self-Organizing Growth Mode on High-Index Semiconductor Surfaces

1995 ◽  
Author(s):  
Richard NOTZEL ◽  
Jiro TEMMYO ◽  
Atsuo KOZEN ◽  
Toshiaki TAMAMURA ◽  
Takashi FUKUI ◽  
...  
Keyword(s):  
Quantum Dots ◽  
High Index ◽  
Growth Mode ◽  
Semiconductor Surfaces ◽  
Self Organizing

GROWTH AND CHARACTERIZATION OF ATOMIC AND NANOMETER SCALE WIRES ON THE SILICON SURFACE

2000 ◽  
Vol 07 (05n06) ◽  
pp. 555-560 ◽  
Author(s):  
J. NOGAMI
Keyword(s):  
Transport Properties ◽  
Electronic Properties ◽  
Self Assembly ◽  
Silicon Surface ◽  
Growth Behavior ◽  
The Self ◽  
Nanometer Scale ◽  
Semiconductor Surfaces ◽  
Length Scales

Growth of metals on semiconductor surfaces can result in the self-assembly of a variety of 1D or 2D structures whose lateral dimensions range from one atom to tens of atoms. Over this range in length scales, STM gives information about the structure, the growth behavior and the electronic properties of these small structures. STM and STS data on several different systems are presented. In addition, ongoing and future efforts to measure the transport properties of these small structures are described.

Self-ordered quantum dots: A new growth mode on high-index semiconductor surfaces

2007 ◽  
pp. 103-122 ◽  
Author(s):  
Richard Nötzel ◽  
Jiro Temmyo ◽  
Atsuo Kozen ◽  
Toshiaki Tamamura ◽  
Takashi Fukui ◽  
...  
Keyword(s):  
Quantum Dots ◽  
High Index ◽  
Growth Mode ◽  
Semiconductor Surfaces

Analyzing reactions of single mechanoenzyme molecules by light microscopy

1992 ◽  
Vol 50 (1) ◽  
pp. 426-427
Author(s):  
Jeff Gelles
Keyword(s):  
Image Processing ◽  
Reaction Mechanisms ◽  
Transient State ◽  
Nanometer Scale ◽  
Reaction Intermediates ◽  
Enzyme Molecule ◽  
Directed Movement ◽  
Enzyme Molecules ◽  
Individual Enzyme ◽  
Single Reaction

Mechanoenzymes are enzymes which use a chemical reaction to power directed movement along biological polymer. Such enzymes include the cytoskeletal motors (e.g., myosins, dyneins, and kinesins) as well as nucleic acid polymerases and helicases. A single catalytic turnover of a mechanoenzyme moves the enzyme molecule along the polymer a distance on the order of 10−9 m We have developed light microscope and digital image processing methods to detect and measure nanometer-scale motions driven by single mechanoenzyme molecules. These techniques enable one to monitor the occurrence of single reaction steps and to measure the lifetimes of reaction intermediates in individual enzyme molecules. This information can be used to elucidate reaction mechanisms and determine microscopic rate constants. Such an approach circumvents difficulties encountered in the use of traditional transient-state kinetics techniques to examine mechanoenzyme reaction mechanisms.

The usefulness of high index low symmetry zone axes for holz line analysis

1987 ◽  
Vol 45 ◽  
pp. 384-385
Author(s):  
C. M. Sung ◽  
D. B. Williams
Keyword(s):  
Lattice Parameter ◽  
High Order ◽  
Zone Axis ◽  
High Index ◽  
High Symmetry ◽  
Second Phases ◽  
Line Patterns ◽  
Low Symmetry ◽  
Line Analysis

Researchers have tended to use high symmetry zone axes (e.g. <111> <114>) for High Order Laue Zone (HOLZ) line analysis since Jones et al reported the origin of HOLZ lines and described some of their applications. But it is not always easy to find HOLZ lines from a specific high symmetry zone axis during microscope operation, especially from second phases on a scale of tens of nanometers. Therefore it would be very convenient if we can use HOLZ lines from low symmetry zone axes and simulate these patterns in order to measure lattice parameter changes through HOLZ line shifts. HOLZ patterns of high index low symmetry zone axes are shown in Fig. 1, which were obtained from pure Al at -186°C using a double tilt cooling holder. Their corresponding simulated HOLZ line patterns are shown along with ten other low symmetry orientations in Fig. 2. The simulations were based upon kinematical diffraction conditions.

Microstructural characterization of sol-gel coating on PET films

1994 ◽  
Vol 52 ◽  
pp. 886-887
Author(s):  
R. T. Chen ◽  
R.A. Norwood
Keyword(s):  
Ion Beam ◽  
Sol Gel ◽  
Industrial Applications ◽  
Hard Coatings ◽  
Nanometer Scale ◽  
Ion Beam Sputtering ◽  
Process Technology ◽  
Refractive Index Measurement ◽  
Organically Modified ◽  
Pet Films

Sol-gel processing has been used to control the structure of a material on a nanometer scale in preparing advanced ceramics and glasses. Film coating using the sol-gel process was also found to be a viable process technology in applications such as optical, porous, antireflection and hard coatings. In this study, organically modified silicate (Ormosil) coatings are applied to PET films for various industrial applications. Sol-gel materials are known to exhibit nanometer scale structures which havepreviously been characterized by small-angle X-ray scattering (SAXS), neutron scattering and light scattering. Imaging of the ultrafine sol-gel structures has also been performed using an ultrahigh resolution replica/TEM technique. The objective of this study was to evaluate the ultrafine structures inthe sol gel coatings using a direct imaging technique: atomic force microscopy (AFM). In addition, correlation of microstructures with processing parameters, coating density and other physical properties will be discussed.The materials evaluated are organically modified silicate coatings on PET film substrates. Refractive index measurement by the prism coupling method was used to assess density of the sol-gel coating.AFM imaging was performed on a Nanoscope III AFM (by Digital Instruments) using constant force mode. Solgel coating samples coated with a thin layer of Ft (by ion beam sputtering) were also examined by STM in order to confirm the structures observed in the contact type AFM. In addition, to compare the previous results, sol-gel powder samples were also prepared by ultrasonication followed by Pt/Au shadowing and examined using a JEOL 100CX TEM.

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