Overlayer strain: A key to directly tune the topography of high‐index semiconductor surfaces

1993 ◽  
Vol 63 (24) ◽  
pp. 3300-3302 ◽  
Author(s):  
Eric Tournié ◽  
Richard Nötzel ◽  
Klaus H. Ploog
Keyword(s):  
High Index ◽  
Semiconductor Surfaces

Ordered Quantum Dots: A New Self-Organizing Growth Mode on High-Index Semiconductor Surfaces

1995 ◽  
Author(s):  
Richard NOTZEL ◽  
Jiro TEMMYO ◽  
Atsuo KOZEN ◽  
Toshiaki TAMAMURA ◽  
Takashi FUKUI ◽  
...  
Keyword(s):  
Quantum Dots ◽  
High Index ◽  
Growth Mode ◽  
Semiconductor Surfaces ◽  
Self Organizing

Tunable generation of nanometer-scale corrugations on high-index III-V semiconductor surfaces

1994 ◽  
Vol 49 (16) ◽  
pp. 11053-11059 ◽  
Author(s):  
Eric Tournié ◽  
Richard Nötzel ◽  
Klaus H. Ploog
Keyword(s):  
High Index ◽  
Nanometer Scale ◽  
Semiconductor Surfaces

Self-ordered quantum dots: A new growth mode on high-index semiconductor surfaces

2007 ◽  
pp. 103-122 ◽  
Author(s):  
Richard Nötzel ◽  
Jiro Temmyo ◽  
Atsuo Kozen ◽  
Toshiaki Tamamura ◽  
Takashi Fukui ◽  
...  
Keyword(s):  
Quantum Dots ◽  
High Index ◽  
Growth Mode ◽  
Semiconductor Surfaces

The usefulness of high index low symmetry zone axes for holz line analysis

1987 ◽  
Vol 45 ◽  
pp. 384-385
Author(s):  
C. M. Sung ◽  
D. B. Williams
Keyword(s):  
Lattice Parameter ◽  
High Order ◽  
Zone Axis ◽  
High Index ◽  
High Symmetry ◽  
Second Phases ◽  
Line Patterns ◽  
Low Symmetry ◽  
Line Analysis

Researchers have tended to use high symmetry zone axes (e.g. <111> <114>) for High Order Laue Zone (HOLZ) line analysis since Jones et al reported the origin of HOLZ lines and described some of their applications. But it is not always easy to find HOLZ lines from a specific high symmetry zone axis during microscope operation, especially from second phases on a scale of tens of nanometers. Therefore it would be very convenient if we can use HOLZ lines from low symmetry zone axes and simulate these patterns in order to measure lattice parameter changes through HOLZ line shifts. HOLZ patterns of high index low symmetry zone axes are shown in Fig. 1, which were obtained from pure Al at -186°C using a double tilt cooling holder. Their corresponding simulated HOLZ line patterns are shown along with ten other low symmetry orientations in Fig. 2. The simulations were based upon kinematical diffraction conditions.

STRUCTURE OF CLEAN III-V SEMICONDUCTOR SURFACES

1989 ◽  
Vol 50 (C7) ◽  
pp. C7-119-C7-128
Author(s):  
M. SAUVAGE-SIMKIN
Keyword(s):  
Semiconductor Surfaces
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