scholarly journals Excitonic transitions in GaAs-AlxGa1−xAs multiple quantum wells affected by interface roughness

1989 ◽  
Vol 40 (17) ◽  
pp. 11862-11867 ◽  
Author(s):  
P. Zhou ◽  
H. X. Jiang ◽  
R. Bannwart ◽  
S. A. Solin ◽  
G. Bai
2003 ◽  
Vol 93 (8) ◽  
pp. 4933-4935 ◽  
Author(s):  
Fei Chen ◽  
M. C. Cheung ◽  
Paul M. Sweeney ◽  
W. D. Kirkey ◽  
M. Furis ◽  
...  

2008 ◽  
Vol 25 (11) ◽  
pp. 4143-4146 ◽  
Author(s):  
Zhao De-Gang ◽  
Jiang De-Sheng ◽  
Zhu Jian-Jun ◽  
Liu Zong-Shun ◽  
Zhang Shu-Ming ◽  
...  

2004 ◽  
Vol 37 (3) ◽  
pp. 391-394 ◽  
Author(s):  
J. C. Zhang ◽  
J. F. Wang ◽  
Y. T. Wang ◽  
M. Wu ◽  
J. P. Liu ◽  
...  

InGaN/GaN multiple quantum wells (MQWs) are grown by metal-organic chemical vapour deposition on (0001) sapphire substrates. Triple-axis X-ray diffraction (TXRD) and photoluminescence (PL) spectra are used to assess the influence of trimethylgallium (TMGa) flow on structural defects, such as dislocations and interface roughness, and the optical properties of the MQWs. In this paper, a method, involving an ω scan of every satellite peak of TXRD, is presented to measure the mean dislocation density of InGaN/GaN MQWs. The experimental results show that under certain conditions which keep the trimethlyindium flow constant, dislocation density and interface roughness decrease with the increase of TMGa flow, which will improve the PL properties. It can be concluded that dislocations, especially edge dislocations, act as non-radiative recombination centres in InGaN/GaN MQWs. Also noticed is that changing the TMGa flow has more influence on edge dislocations than screw dislocations.


2018 ◽  
Vol 123 (20) ◽  
pp. 205705 ◽  
Author(s):  
Hideaki Murotani ◽  
Yuya Hayakawa ◽  
Kazuki Ikeda ◽  
Hideto Miyake ◽  
Kazumasa Hiramtsu ◽  
...  

2001 ◽  
Vol 08 (05) ◽  
pp. 537-540
Author(s):  
D. H. ZHANG

The effects of Be doping in the wells of the p-type pseudomorphic InGaAs/AlGaAs multiple quantum wells were characterized using photoluminescence and X-ray diffraction techniques. It is found that high doping in the wells causes shift of energy levels and deteriorates the well–barrier interfaces of the quantum well structures. The shift of the energy levels is mainly due to the band gap shrinkage while the interface roughness can be explained by interstitial doping.


Sign in / Sign up

Export Citation Format

Share Document