Core- and valence-band energy-level shifts in small two-dimensional islands of gold deposited on Pt(100): The effect of step-edge, surface, and bulk atoms

1983 ◽  
Vol 28 (2) ◽  
pp. 1158-1160 ◽  
Author(s):  
M. Salmerón ◽  
S. Ferrer ◽  
M. Jazzar ◽  
G. A. Somorjai
1999 ◽  
Vol 567 ◽  
Author(s):  
A. Shanware ◽  
H. Z. Massoud ◽  
A. Acker ◽  
V. Z. Q. Li ◽  
M. R. Mirabedini ◽  
...  

ABSTRACTThe performance of CMOS devices improves due to the addition of Ge in their poly-Si gate material. The presence of Ge in the gate increases the current drive due to the reduction of the flatband voltage. The change in the flatband voltage is due to a shift in the valence-band energy level in the gate. This shift results in a change in the barrier height for electrons tunneling from the gate. Thus, the presence of Ge in the gate increases the tunneling current in the gate. This increase may result in a limitation in the use of SiGe gates in future generations of MOSFETs with ultrathin gate dielectrics. The purpose of this work is to investigate the effect of Ge content on the tunneling current in CMOS devices with ultrathin gate dielectrics.


1998 ◽  
Vol 57 (8) ◽  
pp. 4349-4357 ◽  
Author(s):  
Z. Fang ◽  
X. Guo ◽  
S. A. Canney ◽  
S. Utteridge ◽  
M. J. Ford ◽  
...  

2017 ◽  
Vol 96 (3) ◽  
Author(s):  
G. M. Minkov ◽  
V. Ya. Aleshkin ◽  
O. E. Rut ◽  
A. A. Sherstobitov ◽  
A. V. Germanenko ◽  
...  

2012 ◽  
Vol 85 (20) ◽  
Author(s):  
James T. Teherani ◽  
Winston Chern ◽  
Dimitri A. Antoniadis ◽  
Judy L. Hoyt ◽  
Liliana Ruiz ◽  
...  

1972 ◽  
Vol 6 (6) ◽  
pp. 2269-2273 ◽  
Author(s):  
C. W. Litton ◽  
D. C. Reynolds ◽  
T. C. Collins

1994 ◽  
Vol 50 (23) ◽  
pp. 16921-16930 ◽  
Author(s):  
V. A. Kulbachinskii ◽  
M. Inoue ◽  
M. Sasaki ◽  
H. Negishi ◽  
W. X. Gao ◽  
...  

AIP Advances ◽  
2017 ◽  
Vol 7 (7) ◽  
pp. 075016 ◽  
Author(s):  
K. Collar ◽  
J. Li ◽  
W. Jiao ◽  
Y. Guan ◽  
M. Losurdo ◽  
...  

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