scholarly journals Multiple crossing points and possible quantum criticality in the magnetoresistance of thin TiN films

2021 ◽  
Vol 103 (18) ◽  
Author(s):  
K. Kronfeldner ◽  
T. I. Baturina ◽  
C. Strunk
Keyword(s):  
Quantum Criticality ◽  
Tin Films

Electron microscopy study of reactively sputter-deposited Ti/N films on silicon

1992 ◽  
Vol 50 (2) ◽  
pp. 1362-1363
Author(s):  
V. C. Kannan ◽  
A. K. Singh ◽  
R. B. Irwin ◽  
S. Chittipeddi ◽  
F. D. Nkansah ◽  
...  
Keyword(s):  
Integrated Circuits ◽  
Large Scale ◽  
Hexagonal Phase ◽  
Microscopy Study ◽  
Electron Microscopy Study ◽  
Process Conditions ◽  
Tin Films ◽  
Wide Range ◽  
Fcc Phase ◽  
Circuits Vlsi

Titanium nitride (TiN) films have historically been used as diffusion barrier between silicon and aluminum, as an adhesion layer for tungsten deposition and as an interconnect material etc. Recently, the role of TiN films as contact barriers in very large scale silicon integrated circuits (VLSI) has been extensively studied. TiN films have resistivities on the order of 20μ Ω-cm which is much lower than that of titanium (nearly 66μ Ω-cm). Deposited TiN films show resistivities which vary from 20 to 100μ Ω-cm depending upon the type of deposition and process conditions. TiNx is known to have a NaCl type crystal structure for a wide range of compositions. Change in color from metallic luster to gold reflects the stabilization of the TiNx (FCC) phase over the close packed Ti(N) hexagonal phase. It was found that TiN (1:1) ideal composition with the FCC (NaCl-type) structure gives the best electrical property.

Preparation of TiN Films by Magnetron Sputtering and Diagnostics for Optical Emission of Magnetron Plasma.

Shinku ◽  
1995 ◽  
Vol 38 (3) ◽  
pp. 339-342 ◽  
Author(s):  
Yasuki AIHARA ◽  
Yuko HIROHATA ◽  
Tomoaki HINO ◽  
Toshiro YAMASHINA
Keyword(s):  
Magnetron Sputtering ◽  
Optical Emission ◽  
Tin Films

Quantum criticality in NdFe2Ga8 under magnetic field

2021 ◽  
Vol 103 (3) ◽  
Author(s):  
Cuixiang Wang ◽  
Xingyu Wang ◽  
Le Wang ◽  
Meng Yang ◽  
Youting Song ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Quantum Criticality

scholarly journals Crystal Orientation-Dependent Oxidation of Epitaxial TiN Films with Tunable Plasmonics

ACS Photonics ◽  
2021 ◽  
Vol 8 (3) ◽  
pp. 847-856
Author(s):  
Ruyi Zhang ◽  
Qian-Ying Ma ◽  
Haigang Liu ◽  
Tian-Yu Sun ◽  
Jiachang Bi ◽  
...  
Keyword(s):  
Crystal Orientation ◽  
Tin Films

Quantum criticality and correlations in the Ising-Gamma chain

2021 ◽  
pp. 126122
Author(s):  
Zi-An Liu ◽  
Yu-Li Dong ◽  
Ning Wu ◽  
Yimin Wang ◽  
Wen-Long You
Keyword(s):  
Quantum Criticality ◽  
Gamma Chain

scholarly journals Limits to magnetic quantum criticality from nuclear spins

2021 ◽  
Vol 103 (6) ◽  
Author(s):  
Heike Eisenlohr ◽  
Matthias Vojta
Keyword(s):  
Quantum Criticality ◽  
Nuclear Spins

scholarly journals Lattice vibration as a knob on exotic quantum criticality

2021 ◽  
Vol 103 (1) ◽  
Author(s):  
SangEun Han ◽  
Junhyun Lee ◽  
Eun-Gook Moon
Keyword(s):  
Lattice Vibration ◽  
Quantum Criticality
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