Preparation of TiN Films by Magnetron Sputtering and Diagnostics for Optical Emission of Magnetron Plasma.

Shinku ◽  
1995 ◽  
Vol 38 (3) ◽  
pp. 339-342 ◽  
Author(s):  
Yasuki AIHARA ◽  
Yuko HIROHATA ◽  
Tomoaki HINO ◽  
Toshiro YAMASHINA
Keyword(s):  
Magnetron Sputtering ◽  
Optical Emission ◽  
Tin Films

scholarly journals Influence of modulation frequency on the synthesis of thin films in pulsed magnetron sputtering processes

2018 ◽  
Vol 36 (4) ◽  
pp. 697-703 ◽  
Author(s):  
G.W. Strzelecki ◽  
K. Nowakowska-Langier ◽  
R. Chodun ◽  
S. Okrasa ◽  
B. Wicher ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Optical Emission Spectroscopy ◽  
Film Growth ◽  
Modulation Frequency ◽  
Optical Emission ◽  
Pulsed Power ◽  
Additional Parameter ◽  
The Impact ◽  
Different Levels ◽  
Pulsed Magnetron

AbstractThe research on the influence of modulation frequency on the properties of films synthesized using a unique pulsed power supply combined with a standard unbalanced circular magnetron was conducted in the process of pulsed magnetron sputtering (PMS). It was shown that by using different levels of modulation, the composition of plasma (measured by optical emission spectroscopy, OES) as well as film growth rate and morphology (observed with scanning electron microscope, SEM), can be changed. The impact of modulation is related to the used materials and gases and can vary significantly. It was concluded that modulation frequency can greatly influence the synthesis of materials and can be used as an additional parameter in PMS. Specific relations between modulation frequency and synthesized material require further investigation.

Influence of Pulsed Gas Feeding on Surface Defects and Mechanical Properties of Ti/TiN Multilayered Films Deposited by Ion Beam Assisted Magnetron Sputtering

2014 ◽  
Vol 488-489 ◽  
pp. 48-52
Author(s):  
Zhi Qiang Fu ◽  
Yi Ren ◽  
Cheng Biao Wang ◽  
Wen Yue ◽  
Song Sheng Lin
Keyword(s):  
Magnetron Sputtering ◽  
Flow Rate ◽  
Surface Defects ◽  
Ion Beam ◽  
Ion Current ◽  
Key Factors ◽  
Multilayered Films ◽  
Factors Affecting ◽  
Tin Films ◽  
Sputtering Power

The influence of sputtering power, N2 flow rate, ion current and substrate temperature on the monolayer TiN films deposited by ion beam assisted magnetron sputtering and the effect of the on-off ratio and deposition period on the multilayered Ti/TiN films was studied. It was found that the key factors affecting surface defects of monolayer TiN films are sputtering power and N2 flow rate while ion current is the most significant factor affecting the hardness of monolayer TiN films. The surface defects can be greatly inhibited by pulsed gas feeding. The adhesion and hardness of the multilayered Ti/TiN films is improved with increasing on-off ratio or decreasing deposition period; the on-off ratio has a negligible effect on the surface defects of the multilayered Ti/TiN films while the surface defects of the multilayered Ti/TiN films become more obvious at a long deposition period.

Morphology control of conductive TiN films produced by air-based magnetron sputtering

2018 ◽  
Vol 350 ◽  
pp. 1091-1097 ◽  
Author(s):  
Kai-Ling Chuang ◽  
Ming-Ting Tsai ◽  
Fu-Hsing Lu
Keyword(s):  
Magnetron Sputtering ◽  
Morphology Control ◽  
Tin Films

Technological Features of the Thick Tin Film Deposition by with Magnetron Sputtering Form Liquid-Phase Target

2018 ◽  
Vol 781 ◽  
pp. 8-13 ◽  
Author(s):  
Mariya Makarova ◽  
Konstantin Moiseev ◽  
Alexander Nazarenko ◽  
Petr Luchnikov ◽  
Galina Dalskaya ◽  
...  
Keyword(s):  
Liquid Phase ◽  
Magnetron Sputtering ◽  
Deposition Rate ◽  
Amorphous Structure ◽  
Film Deposition ◽  
High Deposition Rate ◽  
Crucible Material ◽  
Tin Films ◽  
X Ray ◽  
Tin Film

Technological features of obtaining of tin films in a vacuum by liquid-phase target magnetron sputtering were reviewed. With high deposition rate the white color tin coating with amorphous structure is formed on the substrate. X-ray microanalysis of the obtained tin films showed the presence of micro-and nanoparticles of an impurity of the crucible material in the structure of the films. The use of the tantalum crucible with liquid-phase target magnetron sputtering with deposition rate of 3.2 μm / min allows obtaining ultra-pure, continuous, homogeneous tin film on a stationary substrate without impurity material of the crucible.

Influence of nitrogen content on the thermal diffusivity of TiN films prepared by magnetron sputtering

2019 ◽  
Vol 36 (2) ◽  
pp. 192-198 ◽  
Author(s):  
Guiyun Lu ◽  
Lihua Yu ◽  
Hongbo Ju ◽  
Bin Zuo ◽  
Junhua Xu
Keyword(s):  
Thermal Diffusivity ◽  
Magnetron Sputtering ◽  
Nitrogen Content ◽  
Tin Films
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