Anomalous Hall effect in graphene coupled to a layered magnetic semiconductor

2021 ◽  
Vol 103 (12) ◽  
Author(s):  
Hua-Ding Song ◽  
Peng-Fei Zhu ◽  
Jingzhi Fang ◽  
Ziqi Zhou ◽  
Huai Yang ◽  
...  
2019 ◽  
Vol 33 (13) ◽  
pp. 1950121 ◽  
Author(s):  
Juan Pei ◽  
Shu-Qin Xiao ◽  
Li-Min He ◽  
Kun Zhang ◽  
Huan-Huan Li ◽  
...  

The large nonlinear Hall effect was found in (FeCo)[Formula: see text]Ge[Formula: see text]/Ge heterojunctions formed by sputtering amorphous [Formula: see text]-type (FeCo)[Formula: see text]Ge[Formula: see text] magnetic semiconductor films on near intrinsic n-type Ge substrate. It is very interesting that the mechanisms of the large nonlinear Hall effect in (FeCo)[Formula: see text]Ge[Formula: see text]/Ge heterojunctions are different at different temperature ranges. Below 10 K, the Hall resistance of (FeCo)[Formula: see text]Ge[Formula: see text]/Ge heterojunctions is almost the same as the anomalous Hall effect of (FeCo)[Formula: see text]Ge[Formula: see text] ferromagnetic films. While the temperature increased from 10 to 60 K, the nonlinear Hall resistance, longitudinal conductance, and magnetoresistance all increased quickly and reached the maximum at T[Formula: see text]=[Formula: see text]60 K. In this case, thermally excited conducting carriers can tunnel through the interfacial potential barrier in (FeCo)[Formula: see text]Ge[Formula: see text]/Ge heterojunctions. Thus, in the range of 10–60 K, the enhanced nonlinear Hall resistance can be attributed to the anomalous Hall effect which was further enhanced by interfacial Rashba spin–orbit coupling effect. When the temperature further increased from 60 to 250 K, the interfacial potential barrier weakened gradually, and the Hall resistance and magnetoresistance decreased due to the shunting of the Ge substrate. In this case, the nonlinear Hall effect of (FeCo)[Formula: see text]Ge[Formula: see text]/Ge heterojunctions can be explained very well by the two-band model of nonlinear Hall effect.


JETP Letters ◽  
2015 ◽  
Vol 101 (2) ◽  
pp. 130-135 ◽  
Author(s):  
E. I. Yakovleva ◽  
L. N. Oveshnikov ◽  
A. V. Kochura ◽  
K. G. Lisunov ◽  
E. Lahderanta ◽  
...  

2018 ◽  
Vol 532 ◽  
pp. 119-125
Author(s):  
Dang Duc Dung ◽  
Jiyoun Choi ◽  
Wuwei Feng ◽  
Nguyen Cao Khang ◽  
Sunglae Cho

2015 ◽  
Vol 5 (1) ◽  
Author(s):  
L. N. Oveshnikov ◽  
V. A. Kulbachinskii ◽  
A. B. Davydov ◽  
B. A. Aronzon ◽  
I. V. Rozhansky ◽  
...  

2012 ◽  
Vol 100 (9) ◽  
pp. 092404 ◽  
Author(s):  
Jia-Hsien Yao ◽  
Hsiu-Hau Lin ◽  
Yun-Liang Soo ◽  
Tai-Sing Wu ◽  
Jai-Lin Tsai ◽  
...  

2017 ◽  
Vol 124 (3) ◽  
pp. 493-495
Author(s):  
R. K. Arslanov ◽  
T. R. Arslanov ◽  
M. I. Daunov

2008 ◽  
Vol 1119 ◽  
Author(s):  
N.B. Ukah ◽  
R K Gupta ◽  
K Ghosh ◽  
P K Kahol ◽  
R Giedd

AbstractWe report the experimental study of the structural and magnetotransport properties of chromium-doped indium oxide (In2O3:Cr) thin films using x-ray diffractometer, and by measuring the resistivity and Hall effect as a function of temperature in various magnetic fields. The In2O3:Cr diluted magnetic semiconductor thin films were grown under different partial oxygen pressures (Po2) on sapphire substrates using pulsed laser deposition (PLD) technique. Observed expansions in lattice parameter and crystal size in these films with increase in oxygen growth pressure are traceable to the reduction in oxygen vacancies. A redshift of the absorption edges of the samples with increase in oxygen growth pressure is attributed to the significant improvement in crystallinity. The exchange interaction between the electron spins in the conduction band and the spins of the Cr 3d electrons was evident in the anomalous Hall effect (AHE), which persisted up to 300 K. An analysis of the dc electrical transport in the films was carried out using hopping conduction and ionized impurity scattering models.


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