scholarly journals Increased lifetime of metastable skyrmions by controlled doping

2019 ◽  
Vol 100 (1) ◽  
Author(s):  
M. T. Birch ◽  
R. Takagi ◽  
S. Seki ◽  
M. N. Wilson ◽  
F. Kagawa ◽  
...  
Keyword(s):  
2009 ◽  
Vol 15 (13) ◽  
pp. 3186-3197 ◽  
Author(s):  
Yongan Yang ◽  
Ou Chen ◽  
Alexander Angerhofer ◽  
Y. Charles Cao

2018 ◽  
Vol 7 (3) ◽  
pp. 223
Author(s):  
Paulina Raquel Martínez-Alanis ◽  
Antonio Alvarez de la Paz ◽  
Ruben Santamaria

<p>New materials can be created by modifying matter. In this work we characterize graphene and boron-nitride (BN) layers after doping them with BN and carbon dimers, respectively, in different amounts and with different spatial distributions. We provide the energetic description, electron density features, molecular electrostatic potential maps, net charge populations, and the speeds of propagating waves on the hybridized layers. We show the possibility of designing molecular electrostatic potentials from a spatially controlled doping. A strategy is illustrated on a BN hybrid layer with the adsorption of DNA nucleic acid bases.</p>


Author(s):  
M. Pfaiffer ◽  
T. Fritz ◽  
J. Blochwitz ◽  
A. Nollau ◽  
B. Plönnigs ◽  
...  

2018 ◽  
Vol 52 (1) ◽  
pp. 015301 ◽  
Author(s):  
Daniel Mayer ◽  
Felix Schmidt ◽  
Daniel Adam ◽  
Steve Haupt ◽  
Jennifer Koch ◽  
...  

2011 ◽  
Vol 2 (1) ◽  
pp. 20 ◽  
Author(s):  
M. Azrakantsyan ◽  
D. Albach ◽  
N. Ananyan ◽  
V. Gevorgyan ◽  
J.-C. Chanteloup

ACS Nano ◽  
2014 ◽  
Vol 8 (2) ◽  
pp. 1923-1931 ◽  
Author(s):  
Su-Ting Han ◽  
Ye Zhou ◽  
Qing Dan Yang ◽  
Li Zhou ◽  
Long-Biao Huang ◽  
...  

1983 ◽  
Vol 13 ◽  
Author(s):  
C Hill

ABSTRACTA brief history and present state of beam processing techniques and applications to silicon integrated circuit technology are given. The viability of incorporating pulse-laser controlled doping profiles into the emitter-base structure of an advanced bipolar transistor is discussed. The areas of present I.C. technology which will constrain future device development are identified, and the contribution that beam processing can make in removing these constraints is discussed. The beam processing techniques most likely to be found in future I.C. technologies are described.


2016 ◽  
Vol 28 (19) ◽  
pp. 6917-6924 ◽  
Author(s):  
Zhen Wu ◽  
Jun Li ◽  
Xin Li ◽  
Min Zhu ◽  
Ke-chen Wu ◽  
...  

2016 ◽  
Vol 80 ◽  
pp. 115-119 ◽  
Author(s):  
Misuk Si ◽  
Won Jin Choi ◽  
Yoon Jang Jeong ◽  
Young Kuk Lee ◽  
Ju-Jin Kim ◽  
...  
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