Evaluation of image distortion in SEM by using a dot-array–based certified reference material

Microscopy ◽  
2021 ◽  
Author(s):  
Kazuhiro Kumagai ◽  
Akira Kurokawa
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Reference Material ◽  
Certified Reference Material ◽  
Test Specimen ◽  
Image Distortion ◽  
Straightforward Method ◽  
Certified Value ◽  
Array Structure ◽  
Scanning Electron

Abstract This paper presents a quick and straightforward method to evaluate image distortion in scanning electron microscopy using a certified reference material (CRM) as a test specimen. The CRM has a square dot-array structure, whose dot-pitch has an accredited value. By calculating the distance between each dot of the CRM via image analysis, we can detect the distortion in the image as variations of dot interval. Furthermore, by considering the uncertainty of the certified value, it is possible to quantitatively evaluate the significance of the distortion in the image. This method enables us to easily estimate the uncertainty from image distortion, which can improve the reliability of measurement by scanning electron microscopy.

Low-voltage Scanning Electron Microscopy of polymers

1986 ◽  
Vol 44 ◽  
pp. 676-677 ◽  
Author(s):  
O. W. Vaz ◽  
S. J. Krause
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Low Voltage ◽  
Polymer Surface ◽  
Image Distortion ◽  
Crossover Point ◽  
Voltage Scanning ◽  
Beam Damage ◽  
Scanning Electron

Scanning electron microscopy (SEM) of polymers at routine operating voltages of 15 to 25 keV can lead to beam damage and sample image distortion due to charging. These problems may be avoided by imaging polymer samples at a “crossover point”, which is located at low accelerating voltages (0.1 to 2.0 keV), where the number of electrons impinging on the sample are equal to the number of outgoing electrons emerging from the sample. This condition permits the polymer surface to remain electrically neutral and prevents image distortion due to “charging” effects. In this research we have examined Teflon (polytetrafluorethylene) samples and studied the effects of accelerating voltage and sample tilting on charging phenomena. We have also determined the approximate position of the “crossover point”.

Protection of Wood to against Degradation by TiO2: Scanning Electron Microscopy and Energy Dispersive Spectroscopy

2021 ◽  
Vol 898 ◽  
pp. 87-92
Author(s):  
Zdeněk Prošek ◽  
Petr Svora ◽  
Petr Kuklík
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Electron Microscope ◽  
Reference Material ◽  
Building Industry ◽  
Atmospheric Conditions ◽  
Uv Absorbers ◽  
Wooden Surface ◽  
Wooden Structures ◽  
Scanning Electron

External wooden structures have own place in the building industry for ages. The problem is that wood easily degrades due to UV radiation, atmospheric conditions and biological aggressors. We are trying to eliminate degradable factors by photocatalytic materials (namely titanium oxide). Those materials are efficient UV absorbers and they are able to destroy biological aggressors also. Nowadays, there is no information about the interactions between wooden surface and non-photoactive or photoactive forms of TiO2. TiO2 exists in many morphological forms. The planar particles were chosen for the purpose of our research and applied on a wooden surface. The samples of wood (namely pine) were monitored for 255 days and subsequently evaluated using an electron microscope. The use of TiO2 was compared with reference material and a reference commercial coating.

Morphology Characteristics of Coatings for Forming Applications

2015 ◽  
Vol 818 ◽  
pp. 65-68
Author(s):  
Dagmar Draganovská ◽  
Emil Evin ◽  
Miroslav Tomáš
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Reference Material ◽  
Surface Morphology ◽  
Tool Steel ◽  
Steel Substrate ◽  
Thin Coatings ◽  
Material Tool ◽  
Morphology Characteristics ◽  
Scanning Electron

The contribution focuses to study of selected properties of thin coatings deposited on tool steel. Used samples were prepared by PVD method. Samples were evaluated using the scanning electron microscopy. Characteristics of surface morphology Ra, Rz Rt, RSm and RPc were established according to standard STN EN ISO 4287. The coatings TiN, TiCN, Supral and Exxtral Plus have been deposited on tool steel substrate having a thickness of 16 mm. The morphology characteristics were compared to the surface morphology of the reference material tool steel X155CrVMo12.1.

An Investigation on the Interfacial Transition Zone in Concrete Using SEM

2012 ◽  
Vol 446-449 ◽  
pp. 166-170
Author(s):  
Hsi Chi Yang ◽  
Miao Ying Cheng ◽  
Jung Pin Wang
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Transition Zone ◽  
Calcium Ion ◽  
Test Specimen ◽  
Interfacial Transition Zone ◽  
Small Samples ◽  
Hydration Products ◽  
Compressive Test ◽  
Scanning Electron

The technique of linking the SEM (Scanning Electron Microscopy) photographs taken around the interfacial transition zone area is applied to observe the development of hydration products for aggregate and paste at the different curing ages. This research first chooses the aggregate with clay properties not containing the calcium ion, and then observes the hydration products (such as CH, C-S-H) of calcium ion on the aggregate. Finally it assesses if the aggregate will produce ion exchange with cement and generate the hydration products. The very small samples to be observed are taken from the concrete compressive test specimen and must include both aggregate and paste. They are wiped with alcohol to have better pictures before shooting SEM. Initially, the interface of aggregate and paste is sought using 2000x magnification. However, the hydration products on either side of the interface with a range of 50 μm are observed using 10000x magnification. From the results, it is found that aggregate has not interacted with cement paste to produce hydration products and the bond stress of aggregate and paste is controlled by hydration products of paste.

scholarly journals Effect of Recrystallization on β to α-Sn Allotropic Transition in 99.3Sn–0.7Cu wt. % Solder Alloy Inoculated with InSb

Materials ◽  
2020 ◽  
Vol 13 (4) ◽  
pp. 968
Author(s):  
Agata Skwarek ◽  
Balázs Illés ◽  
Tamás Hurtony ◽  
David Bušek ◽  
Karel Dušek
Keyword(s):  
Crystal Structure ◽  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Reference Material ◽  
Solder Alloy ◽  
Electrical Resistance ◽  
Transition Process ◽  
The Other ◽  
Electrical Resistance Measurements ◽  
Scanning Electron

The effect of recrystallization of 99.3Sn–0.7Cu wt. % solder alloy on the allotropic transition of β to α-Sn (so-called tin pest phenomenon) was investigated. Bulk samples were prepared, and an InSb inoculator was mechanically applied to their surfaces to enhance the transition. Half of the samples were used as the reference material and the other half were annealed at 180 °C for 72 h, which caused the recrystallization of the alloy. The samples were stored at −10 and −20 °C. The β-Sn to α-Sn transition was monitored using electrical resistance measurements. The expansion and separation of the tin grains during the β-Sn to α-Sn transition process were studied using scanning electron microscopy. The recrystallization of the alloy suppressed the tin pest phenomenon considerably since it decreased the number of defects in the crystal structure where heterogeneous nucleation of β-Sn to α-Sn transition could occur. In the case of InSb inoculation, the spreading of the transition towards the bulk was as fast as the spreading parallel to the surface of the sample.

Model-Based Correction of Image Distortion in Scanning Electron Microscopy

2010 ◽  
Vol 437 ◽  
pp. 40-44 ◽  
Author(s):  
Dominic Gnieser ◽  
Carl Georg Frase ◽  
Harald Bosse ◽  
Rainer Tutsch
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Monte Carlo ◽  
Three Dimensional ◽  
Image Formation ◽  
Image Distortion ◽  
3D Analysis ◽  
Monte Carlo Program ◽  
Simulated Images ◽  
Scanning Electron

A new Monte-Carlo program for simulation image formation in scanning electron microscopy for real three-dimensional use is presented; factors of image distortions are realized in the program, in respect of future photogrammetric evaluation. A first attempt for generating a 3D-analysis of simulated images is shown.

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