Discharge physics and atomic layer etching in Ar/C4F6 inductively coupled plasmas with a radio frequency bias

Min Young Yoon; H. J. Yeom; Jung Hyung Kim; Won Chegal; Yong Jai Cho; Deuk-Chul Kwon; Jong-Ryul Jeong; Hyo-Chang Lee

doi:10.1063/5.0047811

Discharge physics and atomic layer etching in Ar/C4F6 inductively coupled plasmas with a radio frequency bias

Physics of Plasmas ◽

10.1063/5.0047811 ◽

2021 ◽

Vol 28 (6) ◽

pp. 063504

Author(s):

Min Young Yoon ◽

H. J. Yeom ◽

Jung Hyung Kim ◽

Won Chegal ◽

Yong Jai Cho ◽

...

Keyword(s):

Radio Frequency ◽

Atomic Layer ◽

Inductively Coupled Plasmas ◽

Inductively Coupled ◽

Coupled Plasmas ◽

Atomic Layer Etching

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Consequences of atomic layer etching on wafer scale uniformity in inductively coupled plasmas

Journal of Physics D Applied Physics ◽

10.1088/1361-6463/aab322 ◽

2018 ◽

Vol 51 (15) ◽

pp. 155201 ◽

Cited By ~ 5

Author(s):

Chad M Huard ◽

Steven J Lanham ◽

Mark J Kushner

Keyword(s):

Atomic Layer ◽

Inductively Coupled Plasmas ◽

Wafer Scale ◽

Inductively Coupled ◽

Coupled Plasmas ◽

Atomic Layer Etching

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Comparison of electron cyclotron resonance and radio-frequency inductively coupled plasmas of Ar and N2: Neutral kinetic energies and source gas cracking

Journal of Applied Physics ◽

10.1063/1.366916 ◽

1998 ◽

Vol 83 (4) ◽

pp. 1917-1923 ◽

Cited By ~ 6

Author(s):

N. Materer ◽

Rory S. Goodman ◽

Stephen R. Leone

Keyword(s):

Radio Frequency ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Inductively Coupled Plasmas ◽

Inductively Coupled ◽

Coupled Plasmas

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Effects of radio-frequency driving power, gas pressure, and nitrogen seeding on the transition dynamics in argon inductively coupled plasmas

Journal of Applied Physics ◽

10.1063/1.1790066 ◽

2004 ◽

Vol 96 (9) ◽

pp. 4771-4776 ◽

Cited By ~ 10

Author(s):

M. Abdur Razzak ◽

Shuichi Takamura ◽

Yoshihiko Uesugi

Keyword(s):

Radio Frequency ◽

Gas Pressure ◽

Inductively Coupled Plasmas ◽

Transition Dynamics ◽

Inductively Coupled ◽

Coupled Plasmas

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Electronic dynamic behavior in inductively coupled plasmas with radio-frequency bias

Chinese Physics B ◽

10.1088/1674-1056/23/11/115202 ◽

2014 ◽

Vol 23 (11) ◽

pp. 115202 ◽

Cited By ~ 1

Author(s):

Fei Gao ◽

Yu-Ru Zhang ◽

Shu-Xia Zhao ◽

Xue-Chun Li ◽

You-Nian Wang

Keyword(s):

Radio Frequency ◽

Dynamic Behavior ◽

Inductively Coupled Plasmas ◽

Inductively Coupled ◽

Coupled Plasmas

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Modeling Injection of Dense Liquid Sprays in Radio Frequency Inductively Coupled Plasmas

Plasma Chemistry and Plasma Processing ◽

10.1007/s11090-004-3027-9 ◽

2005 ◽

Vol 25 (3) ◽

pp. 193-214 ◽

Cited By ~ 8

Author(s):

Yanguang Shan ◽

Javad Mostaghimi

Keyword(s):

Radio Frequency ◽

Inductively Coupled Plasmas ◽

Inductively Coupled ◽

Liquid Sprays ◽

Coupled Plasmas ◽

Dense Liquid

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Radio-frequency plasma potential variations originating from capacitive coupling from the coil antenna in inductively coupled plasmas

Journal of Applied Physics ◽

10.1063/1.369700 ◽

1999 ◽

Vol 85 (7) ◽

pp. 3428-3434 ◽

Cited By ~ 18

Author(s):

M. Watanabe ◽

D. M. Shaw ◽

G. J. Collins ◽

H. Sugai

Keyword(s):

Radio Frequency ◽

Plasma Potential ◽

Capacitive Coupling ◽

Radio Frequency Plasma ◽

Inductively Coupled Plasmas ◽

Inductively Coupled ◽

Frequency Plasma ◽

Coupled Plasmas ◽

Coil Antenna

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Selective Etching of Magnetic Tunnel Junction Materials Using CO/NH3Gas Mixture in Radio Frequency Pulse-Biased Inductively Coupled Plasmas

Japanese Journal of Applied Physics ◽

10.7567/jjap.52.05eb03 ◽

2013 ◽

Vol 52 (5S2) ◽

pp. 05EB03 ◽

Cited By ~ 9

Author(s):

Min Hwan Jeon ◽

Hoe Jun Kim ◽

Kyung Che Yang ◽

Se Koo Kang ◽

Kyong Nam Kim ◽

...

Keyword(s):

Radio Frequency ◽

Tunnel Junction ◽

Magnetic Tunnel Junction ◽

Selective Etching ◽

Radio Frequency Pulse ◽

Inductively Coupled Plasmas ◽

Inductively Coupled ◽

Coupled Plasmas ◽

Frequency Pulse

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Nonlocal electron kinetics and spatial transport in radio-frequency two-chamber inductively coupled plasmas with argon discharges

Journal of Applied Physics ◽

10.1063/1.4986495 ◽

2017 ◽

Vol 121 (23) ◽

pp. 233302 ◽

Cited By ~ 13

Author(s):

Hong Li ◽

Yang Liu ◽

Yu-Ru Zhang ◽

Fei Gao ◽

You-Nian Wang

Keyword(s):

Radio Frequency ◽

Inductively Coupled Plasmas ◽

Electron Kinetics ◽

Inductively Coupled ◽

Coupled Plasmas

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Experimental observation of the skin effect on plasma uniformity in inductively coupled plasmas with a radio frequency bias

Plasma Sources Science and Technology ◽

10.1088/0963-0252/21/3/035003 ◽

2012 ◽

Vol 21 (3) ◽

pp. 035003 ◽

Cited By ~ 16

Author(s):

Hyo-Chang Lee ◽

SeungJu Oh ◽

Chin-Wook Chung

Keyword(s):

Radio Frequency ◽

Experimental Observation ◽

Skin Effect ◽

Inductively Coupled Plasmas ◽

Inductively Coupled ◽

Coupled Plasmas

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Space and phase resolved optical emission in mode transitions of radio-frequency inductively coupled plasmas

Journal of Physics Conference Series ◽

10.1088/1742-6596/162/1/012011 ◽

2009 ◽

Vol 162 ◽

pp. 012011 ◽

Cited By ~ 4

Author(s):

D O'Connell ◽

K Niemi ◽

M Zaka-ul-Islam ◽

T Gans

Keyword(s):

Radio Frequency ◽

Optical Emission ◽

Inductively Coupled Plasmas ◽

Inductively Coupled ◽

Mode Transitions ◽

Coupled Plasmas

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