scholarly journals Characterization of an RF-driven argon plasma at atmospheric pressure using broadband absorption and optical emission spectroscopy

2020 ◽  
Vol 128 (24) ◽  
pp. 243302
Author(s):  
G. Nayak ◽  
M. Simeni Simeni ◽  
J. Rosato ◽  
N. Sadeghi ◽  
P. J. Bruggeman
2007 ◽  
Vol 101 (5) ◽  
pp. 053306 ◽  
Author(s):  
A. Palmero ◽  
E. D. van Hattum ◽  
H. Rudolph ◽  
F. H. P. M. Habraken

2014 ◽  
Vol 670-671 ◽  
pp. 244-248 ◽  
Author(s):  
Jun Yan ◽  
Katsuhiko Hosoi ◽  
Shin-ichi Kuroda

The non-equilibrium atmospheric pressure Ar plasma was applied for the polymerization of maleic anhydride (MA). The deposited films were analyzed by using Fourier transform infrared spectroscopy (FT-IR) proving the monomer was successfully polymerized with retaining the functional groups. The intensity of optical emission spectroscopy (OES) of the plasma jet was found to become weaker when the monomer was introduced into the jet. This was interpreted as the result of the energy transfer from the metastable Ar to the monomer. It was proposed that the excited MA changed into π-π* transition state to produce dimer biradicals which initiate the polymerization.


2021 ◽  
Vol 11 (5) ◽  
pp. 2275
Author(s):  
Rok Zaplotnik ◽  
Gregor Primc ◽  
Alenka Vesel

A suitable technique for localized surface treatment of solid materials is an atmospheric pressure plasma jet (APPJ). The properties of the APPJ plasma often depend on small details like the concentration of gaseous impurities what influences the surface kinetics. The simplest and often most useful configuration of the APPJ is presented, characterized by optical emission spectroscopy (OES), and results are discussed in view of various papers. Furthermore, results of additional recent papers on the characterization of the APPJ by OES are presented as well. Because the APPJ is operating at atmospheric pressure, even the water vapor traces may significantly alter the type and concentration of reactive species. The APPJ sustained in noble gases represents a source of vacuum ultraviolet (VUV) radiation that is absorbed in the surface of the treated material, thus causing bond scission. The addition of minute amounts of reactive gases causes significant suppression of VUV radiation and the formation of reactive radicals. These radicals such as OH, O, N, NO, O3, and alike interact chemically with the surface causing its functionalization. Huge gradients of these radicals have been reported, so the surface finish is limited to the area reached by the radicals. Particularly OH radicals significantly prevail in the OES spectra, even when using very pure noble gas. They may cause suppression of other spectral features. OH radicals are especially pronounced in Ar plasmas. Their density decreases exponentially with a distance from the APPJ orifice.


2005 ◽  
Vol 59 (4) ◽  
pp. 519-528 ◽  
Author(s):  
M. C. García ◽  
C. Yubero ◽  
M. D. Calzada ◽  
M. P. Martínez-Jiménez

A surface-wave-sustained discharge created by using a surfatron device in a tube open to the atmosphere can be used to maintain a microwave (2.45 GHz) plasma at atmospheric pressure at powers of less than 300 W. The TIA ( Torche à Injection Axiale) is a device also producing a plasma that, moreover, permits us to work at high power (higher than 200 W and up to 1000 W). A study of the departure from the thermodynamic equilibrium existing in the argon plasmas created by both devices has been done by using optical emission spectroscopy techniques in order to characterize them and to evaluate their possible advantages when they are used for applied purposes.


2017 ◽  
Vol 2017 ◽  
pp. 1-6
Author(s):  
Robert Miotk ◽  
Bartosz Hrycak ◽  
Mariusz Jasiński ◽  
Jerzy Mizeraczyk

The paper presents the investigations of an atmospheric-pressure argon plasma generated at 915 MHz microwaves using the optical emission spectroscopy (OES). The 915 MHz microwave plasma was inducted and sustained in a waveguide-supplied coaxial-line-based nozzleless microwave plasma source. The aim of presented investigations was to estimate parameters of the generated plasma, that is, excitation temperature of electrons Texc, temperature of plasma gas Tg, and concentration of electrons ne. Assuming that excited levels of argon atoms are in local thermodynamic equilibrium, Boltzmann method allowed in determining the Texc temperature in the range of 8100–11000 K. The temperature of plasma gas Tg was estimated by comparing the simulated spectra of the OH radical to the measured one in LIFBASE program. The obtained Tg temperature ranged in 1200–2800 K. Using a method based on Stark broadening of the Hβ line, the concentration of electrons ne was determined in the range from 1.4 × 1015 to 1.7 × 1015 cm−3, depending on the power absorbed by the microwave plasma.


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