Mode transition in an oxygen low-pressure, very high frequency (162 MHz), multi-tile electrode capacitively coupled plasma

2020 ◽  
Vol 27 (11) ◽  
pp. 110701
Author(s):  
C. Harvey ◽  
N. Sirse ◽  
C. Gaman ◽  
A. R. Ellingboe
Keyword(s):  
High Frequency ◽  
Low Pressure ◽  
Mode Transition ◽  
Very High Frequency ◽  
Capacitively Coupled ◽  
Capacitively Coupled Plasma ◽  
Very High

Measurement of Si, SiF, and SiF2 radicals and SiF4 molecule using very high frequency capacitively coupled plasma employing SiF4

2003 ◽  
Vol 94 (3) ◽  
pp. 1428-1435 ◽  
Author(s):  
Takayuki Ohta ◽  
Ken-ichiro Hara ◽  
Tetsuro Ishida ◽  
Masaru Hori ◽  
Toshio Goto ◽  
...  
Keyword(s):  
High Frequency ◽  
Very High Frequency ◽  
Capacitively Coupled ◽  
Capacitively Coupled Plasma ◽  
Very High

Effects of Driving Frequency on the Translational Temperature and Absolute Density of Si Atoms in Very High Frequency Capacitively Coupled SiF4Plasmas

2003 ◽  
Vol 42 (Part 2, No. 12B) ◽  
pp. L1532-L1534 ◽  
Author(s):  
Takayuki Ohta ◽  
Masaru Hori ◽  
Tetsuro Ishida ◽  
Toshio Goto ◽  
Masafumi Ito ◽  
...  
Keyword(s):  
High Frequency ◽  
Driving Frequency ◽  
Very High Frequency ◽  
Capacitively Coupled ◽  
Translational Temperature ◽  
Absolute Density ◽  
Very High
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