scholarly journals Thermal stability of interface dipole modulation in atomic layer-deposited HfO2/SiO2 multi-stack structures

AIP Advances ◽  
2020 ◽  
Vol 10 (8) ◽  
pp. 085114
Author(s):  
Shutaro Asanuma ◽  
Kyoko Sumita ◽  
Yusuke Miyaguchi ◽  
Kazumasa Horita ◽  
Takehito Jimbo ◽  
...  
2007 ◽  
Vol 84 (9-10) ◽  
pp. 2226-2229 ◽  
Author(s):  
Tae Joo Park ◽  
Jeong Hwan Kim ◽  
Jae Hyuck Jang ◽  
Minha Seo ◽  
Kwang Duk Na ◽  
...  

2011 ◽  
Vol 257 (16) ◽  
pp. 7305-7309 ◽  
Author(s):  
Yue Huang ◽  
Yan Xu ◽  
Shi-Jin Ding ◽  
Hong-Liang Lu ◽  
Qing-Qing Sun ◽  
...  

Author(s):  
Changyu Park ◽  
Changmin Lee ◽  
Woohui Lee ◽  
Jehoon Lee ◽  
Jinyong Kim ◽  
...  

Materials ◽  
2021 ◽  
Vol 14 (7) ◽  
pp. 1642
Author(s):  
Benjamin Hering ◽  
Anne-Kathrin Wolfrum ◽  
Tim Gestrich ◽  
Mathias Herrmann

Wear-resistant, super hard ceramic composites based on cubic boron nitride (cBN) are of great interest to industry. However, cBN is metastable under sintering conditions at normal pressure and converts into the soft hexagonal BN (hBN). Therefore, efforts are being made to avoid this process. Besides short sintering times, the use of coated cBN-particles is a way to minimize this process. Therefore, the thermal stability of TiN coated cBN powders in high purity argon and nitrogen atmospheres up to temperatures of 1600 °C was investigated by thermogravimetry, X-ray phase analysis, scanning electron microscopy and Raman spectroscopy. The TiN coating was prepared by the atomic layer deposition (ALD)-method. The investigations showed that the TiN layer reacts in Ar at T ≥ 1200 °C with the cBN and forms a porous TiB2 layer. No reaction takes place in nitrogen up to temperatures of 1600 °C. Nevertheless, the 20 and 50 nm thin coatings also undergo a recrystallization process during heat treatment up to temperatures of 1600 °C.


Nanoscale ◽  
2020 ◽  
Vol 12 (21) ◽  
pp. 11684-11693
Author(s):  
Eduardo Solano ◽  
Jolien Dendooven ◽  
Ji-Yu Feng ◽  
Philipp Brüner ◽  
Matthias M. Minjauw ◽  
...  

Supported Pt nanoparticle stabilization via Atomic Layer Deposition overcoating with Al2O3 has been proved to prevent particle coarsening during thermal annealing for widely spaced nanoparticles while ensuring surface accessibility for applications.


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