Thermal Stability of Precursors for Atomic Layer Deposition of TiO2, ZrO2, and HfO2: An Ab Initio Study of α-Hydrogen Abstraction in Bis-cyclopentadienyl Dimethyl Complexes

2010 ◽  
Vol 114 (4) ◽  
pp. 1879-1886 ◽  
Author(s):  
Aleksandra Zydor ◽  
Simon D. Elliott
Author(s):  
Changyu Park ◽  
Changmin Lee ◽  
Woohui Lee ◽  
Jehoon Lee ◽  
Jinyong Kim ◽  
...  

Nanoscale ◽  
2020 ◽  
Vol 12 (21) ◽  
pp. 11684-11693
Author(s):  
Eduardo Solano ◽  
Jolien Dendooven ◽  
Ji-Yu Feng ◽  
Philipp Brüner ◽  
Matthias M. Minjauw ◽  
...  

Supported Pt nanoparticle stabilization via Atomic Layer Deposition overcoating with Al2O3 has been proved to prevent particle coarsening during thermal annealing for widely spaced nanoparticles while ensuring surface accessibility for applications.


2012 ◽  
Vol 12 ◽  
pp. S160-S163 ◽  
Author(s):  
Jin-Hyock Kim ◽  
Ji-Hoon Ahn ◽  
Sang-Won Kang ◽  
Jae-Sung Roh ◽  
Se-Hun Kwon ◽  
...  

2020 ◽  
Vol 8 (31) ◽  
pp. 15927-15935
Author(s):  
Haoyu Li ◽  
Hung-Sen Kang ◽  
Simranjit Grewal ◽  
Art J. Nelson ◽  
Shin Ae Song ◽  
...  

In this report, we demonstrate how a uniform angstrom-level oxide overcoat (0.7–1.5 Å) by atomic layer deposition is highly effective not only in enhancing the thermal stability of underlying infiltrated ceria nanoparticles but also in facilitating electrode kinetics.


2015 ◽  
Author(s):  
P. Zhang ◽  
Changhong Sun ◽  
Y. Zhang ◽  
X. Chen ◽  
Y. Y. Chen ◽  
...  

2020 ◽  
Vol 40 (10) ◽  
pp. 3592-3599 ◽  
Author(s):  
Sang-Soon Lim ◽  
Kwang-Chon Kim ◽  
Hansol Jeon ◽  
Ju-Young Kim ◽  
Jun-Yun Kang ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document