Thermal Stability of Precursors for Atomic Layer Deposition of TiO2, ZrO2, and HfO2: An Ab Initio Study of α-Hydrogen Abstraction in Bis-cyclopentadienyl Dimethyl Complexes
2010 ◽
Vol 114
(4)
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pp. 1879-1886
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Keyword(s):
Keyword(s):
2008 ◽
Vol 53
(4)
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pp. 2123-2128
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Keyword(s):
Keyword(s):
Keyword(s):
2017 ◽
Vol 35
(1)
◽
pp. 01B113
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2020 ◽
Vol 40
(10)
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pp. 3592-3599
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