Very low pressure chemical vapor deposition process for selective titanium silicide films

V. Ilderem; R. Reif

doi:10.1063/1.99851

Very low pressure chemical vapor deposition process for selective titanium silicide films

Applied Physics Letters ◽

10.1063/1.99851 ◽

1988 ◽

Vol 53 (8) ◽

pp. 687-689 ◽

Cited By ~ 14

Author(s):

V. Ilderem ◽

R. Reif

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Low Pressure ◽

Titanium Silicide ◽

Chemical Vapor Deposition Process ◽

Pressure Chemical ◽

Vapor Deposition Process

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ANALYSIS OF HEAT AND MASS TRANSFER DURING MULTI-WAFER LOW PRESSURE CHEMICAL VAPOR DEPOSITION PROCESS

Proceeding of International Heat Transfer Conference 11 ◽

10.1615/ihtc11.240 ◽

1998 ◽

Author(s):

K.S. Park ◽

M. Choi

Keyword(s):

Mass Transfer ◽

Chemical Vapor Deposition ◽

Heat And Mass Transfer ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Low Pressure ◽

Chemical Vapor Deposition Process ◽

Pressure Chemical ◽

Vapor Deposition Process

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Improved ultrathin oxynitride formed by thermal nitridation and low pressure chemical vapor deposition process

Applied Physics Letters ◽

10.1063/1.108428 ◽

1992 ◽

Vol 61 (15) ◽

pp. 1790-1792 ◽

Cited By ~ 13

Author(s):

Bikas Maiti ◽

Ming Yin Hao ◽

Insup Lee ◽

Jack C. Lee

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Low Pressure ◽

Chemical Vapor Deposition Process ◽

Pressure Chemical ◽

Thermal Nitridation ◽

Vapor Deposition Process

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4456978 Electrically alterable read only memory semiconductor device made by low pressure chemical vapor deposition process

Microelectronics Reliability ◽

10.1016/0026-2714(85)90470-6 ◽

1985 ◽

Vol 25 (1) ◽

pp. 204

Author(s):

RichardM Morley ◽

JagirS Multani ◽

J Sandhu

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Semiconductor Device ◽

Chemical Vapor ◽

Deposition Process ◽

Low Pressure ◽

Chemical Vapor Deposition Process ◽

Pressure Chemical ◽

Read Only Memory ◽

Vapor Deposition Process

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Silicon epitaxy on germanium using a SiH4 low-pressure chemical-vapor deposition process

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.583672 ◽

1987 ◽

Vol 5 (6) ◽

pp. 1551 ◽

Cited By ~ 3

Author(s):

Kiyohisa Fujinaga

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Low Pressure ◽

Chemical Vapor Deposition Process ◽

Silicon Epitaxy ◽

Pressure Chemical ◽

Vapor Deposition Process

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Effect of Bipolar Charging of SiH4 on the Growth Rate and Crystallinity of Silicon Films Grown in the Atmospheric Pressure Chemical Vapor Deposition Process

Electronic Materials Letters ◽

10.1007/s13391-020-00217-0 ◽

2020 ◽

Vol 16 (4) ◽

pp. 385-395 ◽

Cited By ~ 1

Author(s):

Yoonjung Lee ◽

Heung Nam Han ◽

Woongsik Kim ◽

Nong Moon Hwang

Keyword(s):

Growth Rate ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Deposition Process ◽

Silicon Films ◽

Chemical Vapor Deposition Process ◽

Pressure Chemical ◽

Vapor Deposition Process

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Theoretical Study of Step Coverage and Comparison with Experimental Results from Low Pressure Chemical Vapor Deposition Process of Tungsten Film

Japanese Journal of Applied Physics ◽

10.1143/jjap.34.3216 ◽

1995 ◽

Vol 34 (Part 1, No. 6A) ◽

pp. 3216-3226 ◽

Cited By ~ 14

Author(s):

Jong-Ho Yun ◽

Sang-Kyu Park

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Theoretical Study ◽

Chemical Vapor ◽

Deposition Process ◽

Low Pressure ◽

Experimental Results ◽

Chemical Vapor Deposition Process ◽

Tungsten Film ◽

Pressure Chemical

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ChemInform Abstract: A Two-Step Low Pressure Chemical Vapor Deposition Process for the Production of Tungsten Metal Thin Films.

ChemInform ◽

10.1002/chin.199838290 ◽

2010 ◽

Vol 29 (38) ◽

pp. no-no

Author(s):

D. V. BAXTER ◽

K. G. CAULTON ◽

M. H. CHISHOLM ◽

S.-H. CHUANG ◽

C. D. MINEAR

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Low Pressure ◽

Chemical Vapor Deposition Process ◽

Metal Thin Films ◽

Pressure Chemical ◽

Tungsten Metal

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A low‐beam‐divergence cw (GaAl)As double‐heterostructure laser grown by low‐pressure metallorganic chemical vapor deposition process

Applied Physics Letters ◽

10.1063/1.91338 ◽

1980 ◽

Vol 36 (10) ◽

pp. 795-796 ◽

Cited By ~ 6

Author(s):

J. P. Hirtz ◽

Bui-Dinh-Vuong ◽

J. P. Duchemin ◽

P. Hirtz ◽

B. de Cremoux ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Low Pressure ◽

Beam Divergence ◽

Chemical Vapor Deposition Process ◽

Double Heterostructure ◽

Heterostructure Laser ◽

Vapor Deposition Process

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Gas-Phase Nucleation in an Atmospheric Pressure Chemical Vapor Deposition Process for SiO2Films Using Tetraethylorthosilicate (TEOS)

Japanese Journal of Applied Physics ◽

10.1143/jjap.31.l1439 ◽

1992 ◽

Vol 31 (Part 2, No. 10A) ◽

pp. L1439-L1442 ◽

Cited By ~ 27

Author(s):

Motoaki Adachi ◽

Kikuo Okuyama ◽

Noboru Tohge ◽

Manabu Shimada ◽

Jun-ichi Satoh ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Gas Phase ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Pressure Chemical ◽

Phase Nucleation ◽

Vapor Deposition Process

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Scalable high-mobility MoS2thin films fabricated by an atmospheric pressure chemical vapor deposition process at ambient temperature

Nanoscale ◽

10.1039/c4nr04228j ◽

2014 ◽

Vol 6 (21) ◽

pp. 12792-12797 ◽

Cited By ~ 50

Author(s):

Chung-Che Huang ◽

Feras Al-Saab ◽

Yudong Wang ◽

Jun-Yu Ou ◽

John C. Walker ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Ambient Temperature ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

High Mobility ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Pressure Chemical ◽

Vapor Deposition Process

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