ChemInform Abstract: A Two-Step Low Pressure Chemical Vapor Deposition Process for the Production of Tungsten Metal Thin Films.

ChemInform ◽  
2010 ◽  
Vol 29 (38) ◽  
pp. no-no
Author(s):  
D. V. BAXTER ◽  
K. G. CAULTON ◽  
M. H. CHISHOLM ◽  
S.-H. CHUANG ◽  
C. D. MINEAR
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Low Pressure ◽  
Chemical Vapor Deposition Process ◽  
Metal Thin Films ◽  
Pressure Chemical ◽  
Tungsten Metal

A Novel Direct Liquid Injection Low Pressure Chemical Vapor Deposition System (DLI-LPCVD) for the Deposition of Thin Films

2017 ◽  
Vol 19 (8) ◽  
pp. 1700193 ◽  
Author(s):  
Mattias Vervaele ◽  
Bert De Roo ◽  
Jolien Debehets ◽  
Marilyne Sousa ◽  
Luman Zhang ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Liquid Injection ◽  
Pressure Chemical ◽  
Direct Liquid Injection
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