A low‐beam‐divergence cw (GaAl)As double‐heterostructure laser grown by low‐pressure metallorganic chemical vapor deposition process

J. P. Hirtz;  Bui-Dinh-Vuong; J. P. Duchemin; P. Hirtz; B. de Cremoux; R. Bisaro; P. Merenda; M. Bonnet; E. Duda; G. Mesquida; J. C. Carballes

doi:10.1063/1.91338

A low‐beam‐divergence cw (GaAl)As double‐heterostructure laser grown by low‐pressure metallorganic chemical vapor deposition process

Applied Physics Letters ◽

10.1063/1.91338 ◽

1980 ◽

Vol 36 (10) ◽

pp. 795-796 ◽

Cited By ~ 6

Author(s):

J. P. Hirtz ◽

Bui-Dinh-Vuong ◽

J. P. Duchemin ◽

P. Hirtz ◽

B. de Cremoux ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Low Pressure ◽

Beam Divergence ◽

Chemical Vapor Deposition Process ◽

Double Heterostructure ◽

Heterostructure Laser ◽

Vapor Deposition Process

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ANALYSIS OF HEAT AND MASS TRANSFER DURING MULTI-WAFER LOW PRESSURE CHEMICAL VAPOR DEPOSITION PROCESS

Proceeding of International Heat Transfer Conference 11 ◽

10.1615/ihtc11.240 ◽

1998 ◽

Author(s):

K.S. Park ◽

M. Choi

Keyword(s):

Mass Transfer ◽

Chemical Vapor Deposition ◽

Heat And Mass Transfer ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Low Pressure ◽

Chemical Vapor Deposition Process ◽

Pressure Chemical ◽

Vapor Deposition Process

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Improved ultrathin oxynitride formed by thermal nitridation and low pressure chemical vapor deposition process

Applied Physics Letters ◽

10.1063/1.108428 ◽

1992 ◽

Vol 61 (15) ◽

pp. 1790-1792 ◽

Cited By ~ 13

Author(s):

Bikas Maiti ◽

Ming Yin Hao ◽

Insup Lee ◽

Jack C. Lee

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Low Pressure ◽

Chemical Vapor Deposition Process ◽

Pressure Chemical ◽

Thermal Nitridation ◽

Vapor Deposition Process

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4456978 Electrically alterable read only memory semiconductor device made by low pressure chemical vapor deposition process

Microelectronics Reliability ◽

10.1016/0026-2714(85)90470-6 ◽

1985 ◽

Vol 25 (1) ◽

pp. 204

Author(s):

RichardM Morley ◽

JagirS Multani ◽

J Sandhu

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Semiconductor Device ◽

Chemical Vapor ◽

Deposition Process ◽

Low Pressure ◽

Chemical Vapor Deposition Process ◽

Pressure Chemical ◽

Read Only Memory ◽

Vapor Deposition Process

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Very low pressure chemical vapor deposition process for selective titanium silicide films

Applied Physics Letters ◽

10.1063/1.99851 ◽

1988 ◽

Vol 53 (8) ◽

pp. 687-689 ◽

Cited By ~ 14

Author(s):

V. Ilderem ◽

R. Reif

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Low Pressure ◽

Titanium Silicide ◽

Chemical Vapor Deposition Process ◽

Pressure Chemical ◽

Vapor Deposition Process

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Silicon epitaxy on germanium using a SiH4 low-pressure chemical-vapor deposition process

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.583672 ◽

1987 ◽

Vol 5 (6) ◽

pp. 1551 ◽

Cited By ~ 3

Author(s):

Kiyohisa Fujinaga

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Low Pressure ◽

Chemical Vapor Deposition Process ◽

Silicon Epitaxy ◽

Pressure Chemical ◽

Vapor Deposition Process

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An analysis of the effect of the solid layer for the modified chemical vapor deposition process

Wärme- und Stoffübertragung ◽

10.1007/bf01541187 ◽

1993 ◽

Vol 28 (4) ◽

pp. 169-176 ◽

Cited By ~ 5

Author(s):

Y. T. Lin ◽

M. Choi ◽

R. Greif

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Solid Layer ◽

Vapor Deposition Process

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The Modified Chemical Vapor Deposition Process in a Concentric Annulus: An Extension for Focused High-Rate Deposition

Aerosol Science and Technology ◽

10.1080/02786828808959211 ◽

1988 ◽

Vol 9 (3) ◽

pp. 237-249 ◽

Cited By ~ 18

Author(s):

M. Fiebig ◽

M. Hilgenstock ◽

H.-A. Riemann

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

High Rate ◽

Chemical Vapor Deposition Process ◽

Concentric Annulus ◽

Vapor Deposition Process

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In Situ Monitoring of the Products from the SiH4 + WF 6 Tungsten Chemical Vapor Deposition Process by Micro‐Volume Mass Spectrometry

Journal of The Electrochemical Society ◽

10.1149/1.2221130 ◽

1993 ◽

Vol 140 (12) ◽

pp. 3588-3590 ◽

Cited By ~ 8

Author(s):

Roger W. Cheek ◽

Jeffry A. Kelber ◽

James G. Fleming ◽

Robert S. Blewer ◽

Richard D. Lujan

Keyword(s):

Mass Spectrometry ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

In Situ Monitoring ◽

Chemical Vapor Deposition Process ◽

Vapor Deposition Process

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Effect of Si–H Bond on the Gas-Phase Chemistry of Trimethylsilane in the Hot Wire Chemical Vapor Deposition Process

The Journal of Physical Chemistry A ◽

10.1021/jp203966h ◽

2011 ◽

Vol 115 (37) ◽

pp. 10290-10298 ◽

Cited By ~ 17

Author(s):

Y. J. Shi ◽

X. M. Li ◽

R. Toukabri ◽

L. Tong

Keyword(s):

Chemical Vapor Deposition ◽

Gas Phase ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Hot Wire ◽

Gas Phase Chemistry ◽

Phase Chemistry ◽

Vapor Deposition Process

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GaAs crystal growth from coordination compounds using the organometallic chemical vapor deposition process for solar cells

Solar & Wind Technology ◽

10.1016/0741-983x(86)90044-5 ◽

1986 ◽

Vol 3 (1) ◽

pp. 21-25

Author(s):

A. Zaouk ◽

G. Constant

Keyword(s):

Solar Cells ◽

Chemical Vapor Deposition ◽

Crystal Growth ◽

Vapor Deposition ◽

Coordination Compounds ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Gaas Crystal ◽

Vapor Deposition Process

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