Planar‐embedded InGaAsP/InP heterostructure laser with a semi‐insulating InP current‐blocking layer grown by metalorganic chemical vapor deposition

T. Sanada; K. Nakai; K. Wakao; M. Kuno; S. Yamakoshi

doi:10.1063/1.98789

Planar‐embedded InGaAsP/InP heterostructure laser with a semi‐insulating InP current‐blocking layer grown by metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.98789 ◽

1987 ◽

Vol 51 (14) ◽

pp. 1054-1056 ◽

Cited By ~ 39

Author(s):

T. Sanada ◽

K. Nakai ◽

K. Wakao ◽

M. Kuno ◽

S. Yamakoshi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Blocking Layer ◽

Heterostructure Laser ◽

Current Blocking Layer ◽

Current Blocking ◽

Metalorganic Chemical

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Undoped Al0.48In0.52As grown by metalorganic chemical vapor deposition as the current-blocking layer of laser diodes

Journal of Crystal Growth ◽

10.1016/0022-0248(95)00456-4 ◽

1996 ◽

Vol 158 (4) ◽

pp. 418-424 ◽

Cited By ~ 1

Author(s):

T. Kimura ◽

S. Ochi ◽

T. Ishida ◽

E. Ishimura ◽

T. Sonoda ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Laser Diodes ◽

Chemical Vapor ◽

Blocking Layer ◽

Current Blocking Layer ◽

Current Blocking ◽

Metalorganic Chemical

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Fabrication of InGaAsP/InP buried heterostructure laser using reactive ion etching and metalorganic chemical vapor deposition

IEEE Photonics Technology Letters ◽

10.1109/68.205611 ◽

1993 ◽

Vol 5 (3) ◽

pp. 279-281 ◽

Cited By ~ 19

Author(s):

B.-T. Lee ◽

R.A. Logan ◽

R.F. Kalicek ◽

A.M. Sergent ◽

D.L. Coblentz ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Reactive Ion Etching ◽

Chemical Vapor ◽

Ion Etching ◽

Heterostructure Laser ◽

Buried Heterostructure ◽

Metalorganic Chemical

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Room‐temperature continuous‐wave operation of an AlGaInP double heterostructure laser grown by atmospheric pressure metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.96366 ◽

1985 ◽

Vol 47 (10) ◽

pp. 1027-1028 ◽

Cited By ~ 106

Author(s):

Masao Ikeda ◽

Yoshifumi Mori ◽

Hiromitsu Sato ◽

Kunio Kaneko ◽

Naozo Watanabe

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Continuous Wave ◽

Chemical Vapor ◽

Heterostructure Laser ◽

Continuous Wave Operation ◽

Metalorganic Chemical

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Single mode laser with a V‐shaped active layer grown by metalorganic chemical vapor deposition: A v‐shaped double heterostructure laser

Journal of Applied Physics ◽

10.1063/1.329522 ◽

1981 ◽

Vol 52 (9) ◽

pp. 5429-5433 ◽

Cited By ~ 6

Author(s):

Yoshifumi Mori ◽

Osamu Matsuda ◽

Naozo Watanabe

Keyword(s):

Chemical Vapor Deposition ◽

Active Layer ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Single Mode ◽

Mode Laser ◽

Single Mode Laser ◽

Heterostructure Laser ◽

Metalorganic Chemical

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1.3 μm InGaAsP buried crescent lasers with cobalt‐doped semi‐insulating current blocking layers grown by metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.99994 ◽

1988 ◽

Vol 53 (14) ◽

pp. 1257-1259 ◽

Cited By ~ 4

Author(s):

W. H. Cheng ◽

J. Pooladdej ◽

S. Y. Huang ◽

K. D. Buehring ◽

A. Appelbaum ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Current Blocking ◽

Metalorganic Chemical

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626.2‐nm pulsed operation (300 K) of an AlGaInP double heterostructure laser grown by metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.95804 ◽

1985 ◽

Vol 46 (1) ◽

pp. 7-9 ◽

Cited By ~ 19

Author(s):

Kenichi Kobayashi ◽

Isao Hino ◽

Tohru Suzuki

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Double Heterostructure ◽

Heterostructure Laser ◽

Metalorganic Chemical

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Yellow‐emitting AlGaInP double heterostructure laser diode at 77 K grown by atmospheric metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.95459 ◽

1984 ◽

Vol 45 (9) ◽

pp. 964-966 ◽

Cited By ~ 27

Author(s):

M. Ikeda ◽

M. Honda ◽

Y. Mori ◽

K. Kaneko ◽

N. Watanabe

Keyword(s):

Chemical Vapor Deposition ◽

Laser Diode ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Double Heterostructure ◽

Heterostructure Laser ◽

Metalorganic Chemical

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An embedded stripe Be‐implanted GaAs/GaAlAs double heterostructure laser grown by metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.95463 ◽

1984 ◽

Vol 45 (9) ◽

pp. 927-929 ◽

Cited By ~ 1

Author(s):

D. Fekete

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Double Heterostructure ◽

Heterostructure Laser ◽

Metalorganic Chemical

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cw operation of an AlGaInP double heterostructure laser diode at 77 K grown by atmospheric metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.95363 ◽

1984 ◽

Vol 45 (6) ◽

pp. 661-663 ◽

Cited By ~ 21

Author(s):

M. Ikeda ◽

Y. Mori ◽

M. Takiguchi ◽

K. Kaneko ◽

N. Watanabe

Keyword(s):

Chemical Vapor Deposition ◽

Laser Diode ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Double Heterostructure ◽

Cw Operation ◽

Heterostructure Laser ◽

Metalorganic Chemical

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GaInAsP/InP 1.35 μm double heterostructure laser grown on silicon substrate by metalorganic chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.355244 ◽

1993 ◽

Vol 74 (1) ◽

pp. 743-745 ◽

Cited By ~ 4

Author(s):

K. Mobarhan ◽

C. Jelen ◽

E. Kolev ◽

M. Razeghi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Silicon Substrate ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Double Heterostructure ◽

Heterostructure Laser ◽

Metalorganic Chemical

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