Low threshold pulsed and continuous laser oscillation from AlGaAs/GaAs double heterostructures grown by metalorganic chemical vapor deposition on Si substrates

J. P. van der Ziel; R. D. Dupuis; R. A. Logan; R. M. Mikulyak; C. J. Pinzone; A. Savage

doi:10.1063/1.98266

Low threshold pulsed and continuous laser oscillation from AlGaAs/GaAs double heterostructures grown by metalorganic chemical vapor deposition on Si substrates

Applied Physics Letters ◽

10.1063/1.98266 ◽

1987 ◽

Vol 50 (8) ◽

pp. 454-456 ◽

Cited By ~ 43

Author(s):

J. P. van der Ziel ◽

R. D. Dupuis ◽

R. A. Logan ◽

R. M. Mikulyak ◽

C. J. Pinzone ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Laser Oscillation ◽

Continuous Laser ◽

Si Substrates ◽

Double Heterostructures ◽

Low Threshold ◽

Metalorganic Chemical

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Low threshold, optically pumped, room‐temperature laser oscillation at 0.88 μm from AlGaAs/GaAs double heterostructures grown by metalorganic chemical vapor deposition on Ge‐coated Si substrates

Applied Physics Letters ◽

10.1063/1.96812 ◽

1986 ◽

Vol 48 (25) ◽

pp. 1713-1715 ◽

Cited By ~ 24

Author(s):

J. P. van der Ziel ◽

R. D. Dupuis ◽

J. C. Bean

Keyword(s):

Vapor Deposition ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Laser Oscillation ◽

Optically Pumped ◽

Si Substrates ◽

Double Heterostructures ◽

Low Threshold ◽

Metalorganic Chemical

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Low‐threshold high‐efficiency AlGaAs‐GaAs double‐heterostructure injection lasers grown on Si substrates by metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.98185 ◽

1987 ◽

Vol 50 (7) ◽

pp. 407-409 ◽

Cited By ~ 38

Author(s):

R. D. Dupuis ◽

J. P. van der Ziel ◽

R. A. Logan ◽

J. M. Brown ◽

C. J. Pinzone

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

High Efficiency ◽

Chemical Vapor ◽

Double Heterostructure ◽

Si Substrates ◽

Low Threshold ◽

Injection Lasers ◽

Metalorganic Chemical

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Room‐temperature laser operation of AlGaAs/GaAs double heterostructures fabricated on Si substrates by metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.96515 ◽

1986 ◽

Vol 48 (6) ◽

pp. 413-414 ◽

Cited By ~ 75

Author(s):

Shiro Sakai ◽

Tetsuo Soga ◽

Masanari Takeyasu ◽

Masayoshi Umeno

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Laser Operation ◽

Si Substrates ◽

Double Heterostructures ◽

Metalorganic Chemical

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Improvement in Photoluminescence Efficiency of GaInNAs/GaAs Quantum Wells Grown by Metalorganic Chemical Vapor Deposition for Low-Threshold 1.3 µm Range Lasers

Japanese Journal of Applied Physics ◽

10.1143/jjap.43.5262 ◽

2004 ◽

Vol 43 (8A) ◽

pp. 5262-5268 ◽

Cited By ~ 4

Author(s):

Masao Kawaguchi ◽

Tomoyuki Miyamoto ◽

Fumio Koyama

Keyword(s):

Chemical Vapor Deposition ◽

Quantum Wells ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Low Threshold ◽

Photoluminescence Efficiency ◽

Metalorganic Chemical

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Low‐threshold 1.3‐μm GaInAsP/InP buried heterostructure lasers by liquid phase epitaxy and metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.92697 ◽

1981 ◽

Vol 39 (3) ◽

pp. 188-189 ◽

Cited By ~ 5

Author(s):

Willie Ng ◽

C. S. Hong ◽

H. Manasevit ◽

P. D. Dapkus

Keyword(s):

Chemical Vapor Deposition ◽

Liquid Phase ◽

Liquid Phase Epitaxy ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Buried Heterostructure ◽

Low Threshold ◽

Metalorganic Chemical

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Optical properties of InGaN double heterostructures and quantum wells grown by metalorganic chemical vapor deposition

1997 Digest of the IEEE/LEOS Summer Topical Meeting: Vertical-Cavity Lasers/Technologies for a Global Information Infrastructure/WDM Components Technology/Advanced Semiconductor Lasers and Applications/Gallium Nitride Materials, Processing, and Devices (C ◽

10.1109/leosst.1997.619235 ◽

2002 ◽

Author(s):

R.D. Dupuis ◽

P.A. Grudowski ◽

C.J. Eiting ◽

J. Park ◽

B.S. Shelton ◽

...

Keyword(s):

Optical Properties ◽

Chemical Vapor Deposition ◽

Quantum Wells ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Double Heterostructures ◽

Metalorganic Chemical

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Low-Threshold-Current-Density, Long-Wavelength, Highly Strained InGaAs Laser Grown by Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.44.7485 ◽

2005 ◽

Vol 44 (10) ◽

pp. 7485-7487 ◽

Cited By ~ 2

Author(s):

I-Liang Chen ◽

Wei-Chou Hsu ◽

Hao-Chung Kuo ◽

Hsin-Chieh Yu ◽

Chia-Pin Sung ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Threshold Current ◽

Threshold Current Density ◽

Long Wavelength ◽

Low Threshold ◽

Highly Strained ◽

Metalorganic Chemical

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Degradation of GaAs lasers grown by metalorganic chemical vapor deposition on Si substrates

Applied Physics Letters ◽

10.1063/1.98997 ◽

1987 ◽

Vol 51 (2) ◽

pp. 89-91 ◽

Cited By ~ 71

Author(s):

J. P. van der Ziel ◽

R. D. Dupuis ◽

R. A. Logan ◽

C. J. Pinzone

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Si Substrates ◽

Metalorganic Chemical

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Compositional Dependence of Electrical Properties of Highly (100)-/(001)-Oriented Pb(Zr,Ti)O3Thick Films Prepared on Si Substrates by Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.42.5922 ◽

2003 ◽

Vol 42 (Part 1, No. 9B) ◽

pp. 5922-5926 ◽

Cited By ~ 18

Author(s):

Shintaro Yokoyama ◽

Yoshihisa Honda ◽

Hitoshi Morioka ◽

Gouji Asano ◽

Takahiro Oikawa ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Electrical Properties ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Compositional Dependence ◽

Si Substrates ◽

Metalorganic Chemical

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Temperature engineered growth of low‐threshold quantum well lasers by metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.101242 ◽

1989 ◽

Vol 54 (2) ◽

pp. 105-107 ◽

Cited By ~ 32

Author(s):

K. M. Dzurko ◽

E. P. Menu ◽

C. A. Beyler ◽

J. S. Osinski ◽

P. D. Dapkus

Keyword(s):

Chemical Vapor Deposition ◽

Quantum Well ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Quantum Well Lasers ◽

Low Threshold ◽

Metalorganic Chemical

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