Room‐temperature laser operation of AlGaAs/GaAs double heterostructures fabricated on Si substrates by metalorganic chemical vapor deposition

Shiro Sakai; Tetsuo Soga; Masanari Takeyasu; Masayoshi Umeno

doi:10.1063/1.96515

Room‐temperature laser operation of AlGaAs/GaAs double heterostructures fabricated on Si substrates by metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.96515 ◽

1986 ◽

Vol 48 (6) ◽

pp. 413-414 ◽

Cited By ~ 75

Author(s):

Shiro Sakai ◽

Tetsuo Soga ◽

Masanari Takeyasu ◽

Masayoshi Umeno

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Laser Operation ◽

Si Substrates ◽

Double Heterostructures ◽

Metalorganic Chemical

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Room‐temperature laser operation of quantum‐well Ga(1−x)AlxAs‐GaAs laser diodes grown by metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.90026 ◽

1978 ◽

Vol 32 (5) ◽

pp. 295-297 ◽

Cited By ~ 125

Author(s):

R. D. Dupuis ◽

P. D. Dapkus ◽

Nick Holonyak ◽

E. A. Rezek ◽

R. Chin

Keyword(s):

Chemical Vapor Deposition ◽

Quantum Well ◽

Vapor Deposition ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Laser Diodes ◽

Chemical Vapor ◽

Laser Operation ◽

Gaas Laser ◽

Metalorganic Chemical

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Short‐wavelength room‐temperature continuous‐wave laser operation of InAlP‐InGaP superlattices grown by metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.112181 ◽

1994 ◽

Vol 65 (7) ◽

pp. 854-856 ◽

Cited By ~ 9

Author(s):

R. V. Chelakara ◽

M. R. Islam ◽

J. G. Neff ◽

K. G. Fertitta ◽

A. L. Holmes ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Continuous Wave ◽

Chemical Vapor ◽

Laser Operation ◽

Continuous Wave Laser ◽

Wave Laser ◽

Metalorganic Chemical

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Low threshold, optically pumped, room‐temperature laser oscillation at 0.88 μm from AlGaAs/GaAs double heterostructures grown by metalorganic chemical vapor deposition on Ge‐coated Si substrates

Applied Physics Letters ◽

10.1063/1.96812 ◽

1986 ◽

Vol 48 (25) ◽

pp. 1713-1715 ◽

Cited By ~ 24

Author(s):

J. P. van der Ziel ◽

R. D. Dupuis ◽

J. C. Bean

Keyword(s):

Vapor Deposition ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Laser Oscillation ◽

Optically Pumped ◽

Si Substrates ◽

Double Heterostructures ◽

Low Threshold ◽

Metalorganic Chemical

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Low threshold pulsed and continuous laser oscillation from AlGaAs/GaAs double heterostructures grown by metalorganic chemical vapor deposition on Si substrates

Applied Physics Letters ◽

10.1063/1.98266 ◽

1987 ◽

Vol 50 (8) ◽

pp. 454-456 ◽

Cited By ~ 43

Author(s):

J. P. van der Ziel ◽

R. D. Dupuis ◽

R. A. Logan ◽

R. M. Mikulyak ◽

C. J. Pinzone ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Laser Oscillation ◽

Continuous Laser ◽

Si Substrates ◽

Double Heterostructures ◽

Low Threshold ◽

Metalorganic Chemical

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Optically Pumped Laser Operation of InGaAsP/InGaP Double Heterostructures Grown by Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.22.l429 ◽

1983 ◽

Vol 22 (Part 2, No. 7) ◽

pp. L429-L431 ◽

Cited By ~ 5

Author(s):

Takashi Iwamoto ◽

Kazuo Mori ◽

Masashi Mizuta ◽

Hiroshi Kunimoto

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Laser Operation ◽

Optically Pumped ◽

Double Heterostructures ◽

Optically Pumped Laser ◽

Metalorganic Chemical

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First Room-Temperature Continuous-Wave Operation of Self-Formed InGaAs Quantum Dot-Like Laser on Si substrate Grown by Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.39.3860 ◽

2000 ◽

Vol 39 (Part 1, No. 7A) ◽

pp. 3860-3862 ◽

Cited By ~ 9

Author(s):

Zaman Iqbal Kazi ◽

Takashi Egawa ◽

Takashi Jimbo ◽

Masayoshi Umeno

Keyword(s):

Chemical Vapor Deposition ◽

Quantum Dot ◽

Vapor Deposition ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Continuous Wave ◽

Chemical Vapor ◽

Si Substrate ◽

Continuous Wave Operation ◽

Metalorganic Chemical

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Room-temperature optical transitions in Mg-doped cubic GaN/GaAs(100) grown by metalorganic chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.372139 ◽

2000 ◽

Vol 87 (4) ◽

pp. 2064-2066 ◽

Cited By ~ 8

Author(s):

Dapeng Xu ◽

Hui Yang ◽

D. G. Zhao ◽

S. F. Li ◽

R. H. Wu

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Optical Transitions ◽

Cubic Gan ◽

Metalorganic Chemical ◽

Mg Doped

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Optical properties of InGaN double heterostructures and quantum wells grown by metalorganic chemical vapor deposition

1997 Digest of the IEEE/LEOS Summer Topical Meeting: Vertical-Cavity Lasers/Technologies for a Global Information Infrastructure/WDM Components Technology/Advanced Semiconductor Lasers and Applications/Gallium Nitride Materials, Processing, and Devices (C ◽

10.1109/leosst.1997.619235 ◽

2002 ◽

Author(s):

R.D. Dupuis ◽

P.A. Grudowski ◽

C.J. Eiting ◽

J. Park ◽

B.S. Shelton ◽

...

Keyword(s):

Optical Properties ◽

Chemical Vapor Deposition ◽

Quantum Wells ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Double Heterostructures ◽

Metalorganic Chemical

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Room‐temperature excitons in Ga0.47In0.53As‐InP superlattices grown by low‐pressure metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.97437 ◽

1986 ◽

Vol 49 (17) ◽

pp. 1110-1111 ◽

Cited By ~ 23

Author(s):

M. Razeghi ◽

J. Nagle ◽

P. Maurel ◽

F. Omnes ◽

J. P. Pocholle

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Metalorganic Chemical

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Degradation of GaAs lasers grown by metalorganic chemical vapor deposition on Si substrates

Applied Physics Letters ◽

10.1063/1.98997 ◽

1987 ◽

Vol 51 (2) ◽

pp. 89-91 ◽

Cited By ~ 71

Author(s):

J. P. van der Ziel ◽

R. D. Dupuis ◽

R. A. Logan ◽

C. J. Pinzone

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Si Substrates ◽

Metalorganic Chemical

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