Temperature engineered growth of low‐threshold quantum well lasers by metalorganic chemical vapor deposition

K. M. Dzurko; E. P. Menu; C. A. Beyler; J. S. Osinski; P. D. Dapkus

doi:10.1063/1.101242

Temperature engineered growth of low‐threshold quantum well lasers by metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.101242 ◽

1989 ◽

Vol 54 (2) ◽

pp. 105-107 ◽

Cited By ~ 32

Author(s):

K. M. Dzurko ◽

E. P. Menu ◽

C. A. Beyler ◽

J. S. Osinski ◽

P. D. Dapkus

Keyword(s):

Chemical Vapor Deposition ◽

Quantum Well ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Quantum Well Lasers ◽

Low Threshold ◽

Metalorganic Chemical

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Low-threshold quantum well lasers grown by metalorganic chemical vapor deposition on nonplanar substrates

IEEE Journal of Quantum Electronics ◽

10.1109/3.29280 ◽

1989 ◽

Vol 25 (6) ◽

pp. 1450-1458 ◽

Cited By ~ 38

Author(s):

K.M. Dzurko ◽

E.P. Menu ◽

C.A. Beyler ◽

J.S. Osinski ◽

P.D. Dapkus

Keyword(s):

Chemical Vapor Deposition ◽

Quantum Well ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Quantum Well Lasers ◽

Low Threshold ◽

Metalorganic Chemical

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Dilute Nitride Quantum Well Lasers by Metalorganic Chemical Vapor Deposition

Dilute III-V Nitride Semiconductors and Material Systems - Materials Science ◽

10.1007/978-3-540-74529-7_18 ◽

2008 ◽

pp. 449-501 ◽

Cited By ~ 1

Author(s):

N. Tansu ◽

L. J. Mawst

Keyword(s):

Chemical Vapor Deposition ◽

Quantum Well ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Quantum Well Lasers ◽

Dilute Nitride ◽

Metalorganic Chemical

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Carbon-doped 980-nm InGaAs strained quantum well lasers grown by metalorganic chemical vapor deposition

10.1117/12.319646 ◽

1998 ◽

Cited By ~ 1

Author(s):

Tao Yin ◽

Peng Lian ◽

ZunTu Xu ◽

Changhua Chen ◽

Hongdong Zhao ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Quantum Well ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Quantum Well Lasers ◽

Carbon Doped ◽

Strained Quantum Well ◽

Metalorganic Chemical

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Low-threshold InGaAs/GaAs single-quantum-well lasers using single-step metalorganic chemical vapor deposition

10.1117/12.176612 ◽

1994 ◽

Author(s):

Hanmin Zhao ◽

Michael H. MacDougal ◽

Kushant Uppal ◽

Newton C. Frateschi ◽

Paul D. Dapkus ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Quantum Well ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Single Step ◽

Single Quantum ◽

Single Quantum Well ◽

Low Threshold ◽

Metalorganic Chemical

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Low threshold 1.3μm InAsP/InP Strained Layer Quantum Well Laser Diodes Grown by Metalorganic Chemical Vapor Deposition

13th IEEE International Semiconductor Laser Conference ◽

10.1109/islc.1992.763636 ◽

2005 ◽

Cited By ~ 5

Author(s):

A. Kasukawa ◽

Y. Imajo ◽

T. Namegaya ◽

Y. Hiratani ◽

T. Kikuta

Keyword(s):

Chemical Vapor Deposition ◽

Quantum Well ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Laser Diodes ◽

Chemical Vapor ◽

Strained Layer ◽

Quantum Well Laser ◽

Low Threshold ◽

Metalorganic Chemical

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Optically pumped deep-ultraviolet AlGaN multi-quantum-well lasers grown by metalorganic chemical vapor deposition

10.1117/12.2036835 ◽

2014 ◽

Author(s):

Yuh-Shiuan Liu ◽

Tsung-Ting Kao ◽

Md. Mahbub Satter ◽

Zachary Lochner ◽

Xiao-Hang Li ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Quantum Well ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Quantum Well Lasers ◽

Optically Pumped ◽

Deep Ultraviolet ◽

Multi Quantum Well ◽

Metalorganic Chemical

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InGaAsP multiple quantum well lasers with planar buried heterostructure prepared by metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.99547 ◽

1988 ◽

Vol 52 (25) ◽

pp. 2099-2101 ◽

Cited By ~ 3

Author(s):

H. Ishiguro ◽

T. Kawabata ◽

S. Koike

Keyword(s):

Chemical Vapor Deposition ◽

Quantum Well ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Multiple Quantum Well ◽

Chemical Vapor ◽

Quantum Well Lasers ◽

Multiple Quantum ◽

Buried Heterostructure ◽

Metalorganic Chemical

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InGaAsP/GaAs Quantum Well Lasers Grown by Metalorganic Chemical Vapor Deposition

InP and Related Compounds ◽

10.1201/9781482282986-22 ◽

2000 ◽

pp. 739-798

Keyword(s):

Chemical Vapor Deposition ◽

Quantum Well ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Quantum Well Lasers ◽

Metalorganic Chemical

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Influence of oxygen on the threshold current of AlGaAs multiple quantum well lasers grown by metalorganic chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(94)90087-6 ◽

1994 ◽

Vol 141 (1-2) ◽

pp. 22-28 ◽

Cited By ~ 14

Author(s):

Y. Mihashi ◽

M. Miyashita ◽

N. Kaneno ◽

M. Tsugami ◽

N. Fujii ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Quantum Well ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Multiple Quantum Well ◽

Chemical Vapor ◽

Threshold Current ◽

Quantum Well Lasers ◽

Multiple Quantum ◽

Metalorganic Chemical

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Very narrow graded‐barrier single quantum well lasers grown by metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.93352 ◽

1982 ◽

Vol 41 (10) ◽

pp. 912-914 ◽

Cited By ~ 50

Author(s):

D. Kasemset ◽

C. S. Hong ◽

N. B. Patel ◽

P. D. Dapkus

Keyword(s):

Chemical Vapor Deposition ◽

Quantum Well ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Quantum Well Lasers ◽

Single Quantum ◽

Single Quantum Well ◽

Metalorganic Chemical

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