Redistribution of arsenic in silicon during high pressure thermal oxidation

1987 ◽  
Vol 50 (11) ◽  
pp. 688-690 ◽  
Author(s):  
Seong S. Choi ◽  
M. Z. Numan ◽  
W. K. Chu ◽  
J. K. Srivastava ◽  
E. A. Irene
Keyword(s):  
High Pressure ◽  
Thermal Oxidation

High-pressure thermal oxidation of gallium arsenide at 250°C

1987 ◽  
Vol 23 (24) ◽  
pp. 1329 ◽  
Author(s):  
K.N. Bhat ◽  
N. Basu
Keyword(s):  
High Pressure ◽  
Gallium Arsenide ◽  
Thermal Oxidation

High‐pressure thermal oxidation of InP in steam

1988 ◽  
Vol 63 (2) ◽  
pp. 506-509 ◽  
Author(s):  
R. G. Gann ◽  
K. M. Geib ◽  
C. W. Wilmsen ◽  
J. Costello ◽  
G. Hrychowain ◽  
...  
Keyword(s):  
High Pressure ◽  
Thermal Oxidation

Low Temperature Surface Passivation of Black Silicon Solar Cells by High-Pressure O2 Thermal Oxidation

2013 ◽  
Vol 2 (4) ◽  
pp. Q17-Q20 ◽  
Author(s):  
W. F. Liu ◽  
J. M. Bian ◽  
Z. C. Zhao ◽  
Y. L. Luo ◽  
Z. Yuan ◽  
...  
Keyword(s):  
High Pressure ◽  
Solar Cells ◽  
Low Temperature ◽  
Thermal Oxidation ◽  
Surface Passivation ◽  
Silicon Solar Cells ◽  
Black Silicon ◽  
Temperature Surface

Thermal oxidation kinetics of Ge under high pressure O2

2018 ◽  
Author(s):  
X. Wang ◽  
T. Nishimura ◽  
T. Yajima ◽  
A. Toriumi
Keyword(s):  
High Pressure ◽  
Thermal Oxidation ◽  
Oxidation Kinetics ◽  
Thermal Oxidation Kinetics ◽  
Kinetics Of

Characterisation ofn-channel germanium MOSFET with gate insulator formed by high-pressure thermal oxidation

1987 ◽  
Vol 23 (1) ◽  
pp. 8-10 ◽  
Author(s):  
E.E. Crisman ◽  
J.I. Lee ◽  
P.J. Stiles ◽  
O.J. Gregory
Keyword(s):  
High Pressure ◽  
Thermal Oxidation ◽  
Gate Insulator
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