Scattering loss reduction in ZnO optical waveguides by laser annealing

1981 ◽  
Vol 39 (3) ◽  
pp. 206-208 ◽  
Author(s):  
Subhadra Dutta ◽  
Howard E. Jackson ◽  
J. T. Boyd ◽  
Fred S. Hickernell ◽  
R. L. Davis
Keyword(s):  
Optical Waveguides ◽  
Laser Annealing ◽  
Loss Reduction ◽  
Scattering Loss

scholarly journals Propagation loss reduction in ZnO optical waveguides by CO2 laser annealing.

1995 ◽  
Vol 7 (1) ◽  
pp. 57-58
Author(s):  
Masaki Sawada ◽  
Moriaki Wakaki ◽  
Hiroshi Yoshida
Keyword(s):  
Co2 Laser ◽  
Optical Waveguides ◽  
Laser Annealing ◽  
Propagation Loss ◽  
Loss Reduction

Scattering loss reduction in polymer waveguides by reflowing

2004 ◽  
Vol 40 (16) ◽  
pp. 992 ◽  
Author(s):  
A. Leinse ◽  
M.B.J. Diemeer ◽  
A. Driessen
Keyword(s):  
Loss Reduction ◽  
Polymer Waveguides ◽  
Scattering Loss

scholarly journals Scattering Loss Estimation Using 2-D Fourier Analysis and Modeling of Sidewall Roughness on Optical Waveguides

2013 ◽  
Vol 5 (3) ◽  
pp. 6601010-6601010 ◽  
Author(s):  
E. Jaberansary ◽  
T. M. B. Masaud ◽  
M. M. Milosevic ◽  
M. Nedeljkovic ◽  
G. Z. Mashanovich ◽  
...  
Keyword(s):  
Fourier Analysis ◽  
Optical Waveguides ◽  
Loss Estimation ◽  
Sidewall Roughness ◽  
Scattering Loss

Fully three-dimensional accurate modeling of scattering loss in optical waveguides

2009 ◽  
Vol 41 (4) ◽  
pp. 285-298 ◽  
Author(s):  
Caterina Ciminelli ◽  
Francesco Dell’Olio ◽  
Vittorio M. N. Passaro ◽  
Mario N. Armenise
Keyword(s):  
Optical Waveguides ◽  
Three Dimensional ◽  
Scattering Loss

Low Loss High Mesa Optical Waveguides Based on InGaAsP/InP Heterostructures

2006 ◽  
Vol 6 (11) ◽  
pp. 3562-3566
Author(s):  
W. S. Choi ◽  
J. H. Jang ◽  
B.-A. Yu ◽  
Y. L. Lee ◽  
W. Zhao ◽  
...  
Keyword(s):  
Optical Waveguides ◽  
Inductively Coupled Plasma ◽  
Three Dimensional ◽  
Low Loss ◽  
Sidewall Roughness ◽  
Scattering Loss ◽  
Inductively Coupled ◽  
Atomic Force ◽  
Fabry Perot ◽  
Propagation Losses

Low loss high mesa optical waveguides were fabricated on InGaAsP/InP heterostructures by utilizing inductively-coupled-plasma reactive ion etching (ICP-RIE) and electron beam lithography technique. The fabrication process was optimized by measuring sidewall roughness of deep-etched waveguides. Atomic force microscope loaded with carbon nanotude was used to obtain three-dimensional image of the etched sidewall of waveguides. The obtained statistical information such as rms roughness and correlation length was used to theoretically calculate scattering loss of waveguides. Several waveguides with different number of sharp bends and the length were fabricated and their propagation losses were measured by modified Fabry-Perot method. The measured propagation losses were compared with theoretically calculated losses.

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